|
Volumn 26, Issue 1, 2015, Pages 493-497
|
Effects of sputtering power on structural, electrical and optical properties of Cr-doped ZnO thin films prepared by magnetron sputtering
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CRYSTALLINITY;
ENERGY GAP;
II-VI SEMICONDUCTORS;
IMAGE ENHANCEMENT;
MAGNETRON SPUTTERING;
METALLIC FILMS;
OPTICAL FILMS;
OPTICAL PROPERTIES;
OXIDE MINERALS;
SCANNING ELECTRON MICROSCOPY;
SUBSTRATES;
X RAY DIFFRACTION;
ZINC OXIDE;
CRYSTALLOGRAPHIC STRUCTURE;
ELECTRICAL AND OPTICAL PROPERTIES;
FOUR-POINT PROBE MEASUREMENTS;
GLASS SUBSTRATES;
RADIO FREQUENCY MAGNETRON SPUTTERING;
SPUTTERING POWER;
TRANSMITTANCE SPECTRA;
VISIBLE RANGE;
THIN FILMS;
|
EID: 84925505767
PISSN: 09574522
EISSN: 1573482X
Source Type: Journal
DOI: 10.1007/s10854-014-2426-9 Document Type: Article |
Times cited : (10)
|
References (22)
|