Growth and characterization of SiO2 films deposited by flame hydrolysis deposition system for photonic device application

Progress In Electromagnetics Research M

Volumn 3, Issue , 2008, Pages 165-175

  Bange, J P ^a   Patil, L S ^a   Gautam, D K ^a  

^a North Maharashtra University   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROLYSIS; OPTICAL PROPERTIES; PHOTONIC DEVICES; SILICA; SILICON; SILICON OXIDES; SURFACE ANALYSIS;

CHARACTERISTIC PEAKS; DEPOSITED FILMS; DEVICE APPLICATION; FLAME HYDROLYSIS DEPOSITION; FTIR SPECTROSCOPY; HIGH TEMPERATURE; ROCKING MODES; SIO2 FILM;

SILICON COMPOUNDS;

EID: 84923347107     PISSN: 19378726     EISSN: 10988963     Source Type: Journal    
DOI: 10.2528/PIERM08060401     Document Type: Article

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