-
1
-
-
34547731315
-
ALSI's Low Power Multiple Beam Tech-nology for High Throughput and Low Damage Wa-fer Dicing
-
P. Chall: ALSI's Low Power Multiple Beam Tech-nology for High Throughput and Low Damage Wa-fer Dicing. In: Proceedings of 65th Laser Material Conference. (2006) p.211-215
-
(2006)
In: Proceedings of 65th Laser Material Conference
, pp. 211-215
-
-
Chall, P.1
-
2
-
-
34547813554
-
Dicing of wafers by patented water-jet-guided laser: the total damage free cut
-
B. Richerzhagen, et al.: Dicing of wafers by patented water-jet-guided laser: the total damage free cut. In: Proceedings of 65th Laser Material Conference. (2006) p.197-200
-
(2006)
In: Proceedings of 65th Laser Material Conference
, pp. 197-200
-
-
Richerzhagen, B.1
-
3
-
-
34547769226
-
Advanced Dicing Technology for Semiconductor Wafer-Stealth Dicing
-
M. Kumagagi, et al.: Advanced Dicing Technology for Semiconductor Wafer-Stealth Dicing. In: J. IEEE Transactions on Semiconductor Manufacturing. Vol.20, No.3, (2007) p. 259-265
-
(2007)
In: J. IEEE Transactions on Semiconductor Manufacturing
, vol.20
, Issue.3
, pp. 259-265
-
-
Kumagagi, M.1
-
5
-
-
56349144813
-
Flexible Laser Micro Machining of Semiconductors Materials using Frequency-Quadrupled Solid-State Lasers
-
A. Ostendorf, et al.: Flexible Laser Micro Machining of Semiconductors Materials using Frequency-Quadrupled Solid-State Lasers. In: Proceedings of Micro System Technology (2003) p. 248-255
-
(2003)
In: Proceedings of Micro System Technology
, pp. 248-255
-
-
Ostendorf, A.1
-
6
-
-
0030211787
-
Femtosecond, picosecond and nanosecond laser ablation of solids
-
B. N. Chichkov, et al.: Femtosecond, picosecond and nanosecond laser ablation of solids. In: J. of Applied Physics, A 63 (1996) p. 109-115
-
(1996)
In: J. of Applied Physics, A
, vol.63
, pp. 109-115
-
-
Chichkov, B.N.1
-
7
-
-
0020126962
-
Optical constants for silicon at 300 and 10 K determined from 1.64 to 4.73 eV by elipsometry
-
G.E. Jellison, et al.: Optical constants for silicon at 300 and 10 K determined from 1.64 to 4.73 eV by elipsometry. In: J. of Applied Physics, 53 (1982) 5
-
(1982)
In: J. of Applied Physics
, vol.53
, pp. 5
-
-
Jellison, G.E.1
-
8
-
-
0004115497
-
-
3. Edi-tion. Heidelberg: Springer Verlag
-
D. Bäuerle: Laser Processing and Chemistry. 3. Edi-tion. Heidelberg: Springer Verlag, 2000.-ISBN 3-540-66891-8
-
(2000)
Laser Processing and Chemistry
-
-
Bäuerle, D.1
-
12
-
-
0344119440
-
The strength of the silicon die in flip-chip assemblies
-
B. Cotterell, Z. Chen, J.B. Haan, N.X. Tan: The strength of the silicon die in flip-chip assemblies. J. Electron Packaging (2003) 125, p.114-119
-
(2003)
J. Electron Packaging
, vol.125
, pp. 114-119
-
-
Cotterell, B.1
Chen, Z.2
Haan, J.B.3
Tan, N.X.4
-
13
-
-
33846594365
-
Investigations of influence of dicing techniques on the strength properties of thin silicon
-
S. Schoenfelder, et al.: Investigations of influence of dicing techniques on the strength properties of thin silicon. Microelectronics Reliability 47 (2007) p. 168-178
-
(2007)
Microelectronics Reliability
, vol.47
, pp. 168-178
-
-
Schoenfelder, S.1
|