Chemical solution based MoS2 thin film deposition based on dimensional reduction

Materials Research Society Symposium Proceedings

Volumn 1675, Issue , 2014, Pages 215-218

  Pan, Changqing ^a,b   Gao, Zhongwei ^a   Chang, Chih Hung ^a,b  

^a Oregon State University   (United States)

^b Oregon Process Innovation Center   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHEMICALS; FILMS; FUNCTIONAL MATERIALS; GRAPHENE; MOLYBDENUM COMPOUNDS; OPTOELECTRONIC DEVICES; THIN FILMS; TRANSITION METALS;

AMMONIUM THIOMOLYBDATE; CHEMICAL SOLUTION DEPOSITION; DIMENSIONAL REDUCTION; DIMENSIONAL REDUCTION TECHNIQUES; MOLYBDENUM DISULFIDE; SOLUTION-BASED PROCESS; THIN-FILM DEPOSITIONS; TRANSITION METAL DICHALCOGENIDES;

DEPOSITION;

EID: 84922463667     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2014.889     Document Type: Conference Paper

References (11)

1. A.K. Geim, Science 324, 1530 (2009).
2. A.S. Mayorov, et al, Nano Lett. 11, 2396 (2011).
3. B. Radisavljevic, et al, Nat. Nanotechnol. 6, 147 (2011).
4. Q.H. Wang, et al, Nat. Nanotechnol. 7, 699 (2012).
5. J.N. Coleman et al., Science 331, 568 (2011).
6. Y.-H. Lee, et al, Adv. Mater. 24, 2320 (2012).
7. K.-K. Liu, et al, Nano Lett. 12, 1538 (2012).
8. D.B. Mitzi, Adv. Mater 21, 3141 (2009).
9. D.B. Mitzi, et al, Nature 428, 299 (2004).
10. W. Wang, et al, Adv. Energy Mater, doi: 10.1002/aenm.201301465
11. H. Li, et al, Adv. Funct. Mater. 22, 1385 (2012).