Stable production of TiOx nanoparticles with narrow size distribution by reactive pulsed dc magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 48, Issue 3, 2015, Pages

  Ahadi, Amir Mohammad ^a   Polonskyi, Oleksandr ^a   Schürmann, Ulrich ^a   Strunskus, Thomas ^a   Faupel, Franz ^a  

^a UNIVERSITY OF KIEL   (Germany)

Author keywords

Nanoparticle generation; Pulsed dc sputtering; Reactive sputtering; Stable deposition

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL COMPOUNDS; DEPOSITION; FILM PREPARATION; MASS SPECTROMETRY; NANOPARTICLES; OXIDE FILMS; OXYGEN; REACTIVE SPUTTERING; SIZE DISTRIBUTION; TITANIUM; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY;

CHEMICAL COMPOSITIONS; NANO-PARTICLE PRODUCTION; NANOPARTICLE DEPOSITION; NARROW SIZE DISTRIBUTIONS; OPERATION CONDITIONS; OXYGEN CONCENTRATIONS; PULSED DC MAGNETRON SPUTTERING; PULSED DC SPUTTERING;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84920857664     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/48/3/035501     Document Type: Article

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