Atomic layer deposition grown MOx thin films for solar water splitting: Prospects and challenges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 33, Issue 1, 2015, Pages 1DRUMMY-

  Singh, Trilok ^a   Lehnen, Thomas ^a   Leuning, Tessa ^a   Mathur, Sanjay ^a,b  

^a UNIVERSITY OF COLOGNE   (Germany)

^b XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CONDUCTIVE FILMS; CONDUCTIVE MATERIALS; DEPOSITION; ELECTROCHEMISTRY; ELECTRODES; FILMS; HETEROJUNCTIONS; INTERFACES (MATERIALS); METALLIC COMPOUNDS; METALS; MOS DEVICES; OXIDE FILMS; OXIDE SEMICONDUCTORS; PROTECTIVE COATINGS; SCAFFOLDS; SEMICONDUCTOR MATERIALS; SOLAR ENERGY; SOLAR POWER GENERATION; SUBSTRATES; THIN FILMS;

CHEMICAL TRANSFORMATIONS; ELECTROMAGNETIC SPECTRA; METAL OXIDE SEMICONDUCTOR; METAL OXIDE THIN FILMS; PHOTOELECTROCHEMICAL SYSTEM; PHOTOELECTROCHEMICAL WATER SPLITTING; SOLAR WATER SPLITTING; WATER SPLITTING REACTIONS;

ATOMIC LAYER DEPOSITION;

EID: 84919917536     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4904729     Document Type: Review

References (52)

1. S. M. George, Chem. Rev. 110, 111 (2009). 10.1021/cr900056b
2. C. Marichy, M. Bechelany, and N. Pinna, Adv. Mater. 24, 1017 (2012). 10.1002/adma.201104129
3. T. Suntola and J. Hyvarinen, Annu. Rev. Mater. Sci. 15, 177 (1985). 10.1146/annurev.ms.15.080185.001141
4. T. Singh, T. Lehnen, T. Leuning, D. Sahu, and S. Mathur, Appl. Surf. Sci. 289, 27 (2014). 10.1016/j.apsusc.2013.10.071
5. T. Singh, S. Wang, N. Aslam, H. Zhang, S. Hoffmann-Eifert, and S. Mathur, Chem. Vap. Deposition 20, 291 (2014). 10.1002/cvde.201407122
6. T. Singh and J. Singh, Rev. Adv. Sci. Eng. 2, 313 (2013); 10.1166/rase.2013.1047
7. T. E. Hong, K.-Y. Mun, S.-K. Choi, J.-Y. Park, S.-H. Kim, T. Cheon, W. K. Kim, B.-Y. Lim, and S. Kim, Thin Solid Films 520, 6100 (2012). 10.1016/j.tsf.2012.05.069
8. H.-B.-R. Lee, Y. J. Park, S. Baik, and H. Kim, Chem. Vap. Deposition 18, 41 (2012). 10.1002/cvde.201106937
9. E. Kessels, S. Heil, E. Langereis, H. van Hemmen, H. Knoops, W. Keuning, and R. van de Sanden, ECS Trans. 3, 183 (2007). 10.1149/1.2721487
10. D. Kim, H. Kang, J.-M. Kim, and H. Kim, Appl. Surf. Sci. 257, 3776 (2011). 10.1016/j.apsusc.2010.11.138
11. H. B. Profijt, S. E. Potts, M. C. M. Van De Sanden, and W. M. M. Kessels, J. Vac. Sci. Technol., A 29, 050801 (2011). 10.1116/1.3609974
12. A. J. Bard and L. R. Faulkner, Electrochemical Methods: Fundamentals and Applications (Wiley, New York, 1980).
13. J. Bockris and H. Wroblowa, J. Electroanal. Chem. 7, 428 (1964). 10.1016/0022-0728(64)80123-6
14. P. J. Boddy, J. Electrochem. Soc. 115, 199 (1968). 10.1149/1.2411080
15. A. J. Nozik, Annu. Rev. Phys. Chem. 29, 189 (1978). 10.1146/annurev.pc.29.100178.001201
16. N. S. Lewis, Inorg. Chem. 44, 6900 (2005). 10.1021/ic051118p
17. R. Liu, Z. Zheng, J. Spurgeon, and X. Yang, Energy Environ. Sci. 7, 2504 (2014). 10.1039/C4EE00450G
18. E. McCafferty, Introduction to Corrosion Science (Springer, New York, 2010).
19. H. Gerischer, J. Electroanal. Chem. Interfacial Electrochem. 82, 133 (1977). 10.1016/S0022-0728(77)80253-2
20. Y. Lin, S. Zhou, S. W. Sheehan, and D. Wang, J. Am. Chem. Soc. 133, 2398 (2011). 10.1021/ja110741z
21. S. C. Riha, M. J. DeVries Vermeer, M. J. Pellin, J. T. Hupp, and A. B. F. Martinson, ACS Appl. Mater. Interfaces 5, 360 (2013). 10.1021/am302356k
22. Y. Lin, Y. Xu, M. T. Mayer, Z. I. Simpson, G. McMahon, S. Zhou, and D. Wang, J. Am. Chem. Soc. 134, 5508 (2012). 10.1021/ja300319g
23. O. Zandi, B. M. Klahr, and T. W. Hamann, Energy Environ. Sci. 6, 634 (2013). 10.1039/c2ee23620f
24. B. Klahr, S. Gimenez, F. Fabregat-Santiago, J. Bisquert, and T. W. Hamann, J. Am. Chem. Soc. 134, 16693 (2012). 10.1021/ja306427f
25. X. Yang, C. Du, R. Liu, J. Xie, and D. Wang, J. Catal. 304, 86 (2013). 10.1016/j.jcat.2013.04.014
26. S. C. Riha, J. M. Racowski, M. P. Lanci, J. A. Klug, A. S. Hock, and A. B. F. Martinson, Langmuir 29, 3439 (2013). 10.1021/la305027k
27. Y. J. Hwang, A. Boukai, and P. Yang, Nano Lett. 9, 410 (2008). 10.1021/nl8032763
28. Y. J. Hwang, C. Hahn, B. Liu, and P. Yang, ACS Nano 6, 5060 (2012). 10.1021/nn300679d
29. Y. Lin, S. Zhou, X. Liu, S. Sheehan, and D. Wang, J. Am. Chem. Soc. 131, 2772 (2009). 10.1021/ja808426h
30. C.-C. Wang, C.-C. Kei, and T.-P. Perng, Nanotechnology 22, 365702 (2011). 10.1088/0957-4484/22/36/365702
31. R. Liu, Y. Lin, L.-Y. Chou, S. W. Sheehan, W. He, F. Zhang, H. J. M. Hou, and D. Wang, Angew. Chem. 123, 519 (2011). 10.1002/ange.201004801
32. M. J. Choi, J.-Y. Jung, M.-J. Park, J.-W. Song, J.-H. Lee, and J. H. Bang, J. Mater. Chem. A 2, 2928 (2014). 10.1039/c3ta14443g
33. W. Kim, T. Tachikawa, D. Monllor-Satoca, H.-i. Kim, T. Majima, and W. Choi, Energy Environ. Sci. 6, 3732 (2013). 10.1039/c3ee42151a
34. M. Liu, C.-Y. Nam, C. T. Black, J. Kamcev, and L. Zhang, J. Phys. Chem. C 117, 13396 (2013). 10.1021/jp404032p
35. M. de Ridder et al., J. Phys. Chem. B 106, 13146 (2002). 10.1021/jp0211640
36. M. Lie, H. Fjellvåg, and A. Kjekshus, Thin Solid Films 488, 74 (2005). 10.1016/j.tsf.2005.04.063
37. J. Bachmann, J. Jing, M. Knez, S. Barth, H. Shen, S. Mathur, U. Gösele, and K. Nielsch, J. Am. Chem. Soc. 129, 9554 (2007). 10.1021/ja072465w
38. H. Gao, C. Liu, H. E. Jeong, and P. Yang, ACS Nano 6, 234 (2011). 10.1021/nn203457a
39. R. H. Goncalves, B. H. R. Lima, and E. R. Leite, J. Am. Chem. Soc. 133, 6012 (2011). 10.1021/ja111454f
40. Y. Lin, G. Yuan, S. Sheehan, S. Zhou, and D. Wang, Energy Environ. Sci. 4, 4862 (2011). 10.1039/c1ee01850g
41. K. J. McDonald and K.-S. Choi, Chem. Mater. 23, 4863 (2011). 10.1021/cm202399g
42. M. P. Dare-Edwards, J. B. Goodenough, A. Hamnett, and P. R. Trevellick, J. Chem. Soc., Faraday Trans. 1 79, 2027 (1983). 10.1039/f19837902027
43. F. L. Souza, K. P. Lopes, E. Longo, and E. R. Leite, Phys. Chem. Chem. Phys. 11, 1215 (2009). 10.1039/b811946e
44. A. Fujishima and K. Honda, Nature 238, 37 (1972). 10.1038/238037a0
45. Y. W. Chen, J. D. Prange, S. Duhnen, Y. Park, M. Gunji, C. E. Chidsey, and P. C. McIntyre, Nat. Mater. 10, 539 (2011). 10.1038/nmat3047
46. A. G. Scheuermann, J. D. Prange, M. Gunji, C. E. D. Chidsey, and P. C. McIntyre, Energy Environ. Sci. 6, 2487 (2013). 10.1039/c3ee41178h
47. L. Rovelli, S. D. Tilley, and K. Sivula, ACS Appl. Mater. Interfaces 5, 8018 (2013). 10.1021/am402096r
48. K. Ito and T. Nakazawa, Jpn. J. Appl. Phys., Part 1 27, 2094 (1988). 10.1143/JJAP.27.2094
49. J. Hong Noh, B. Ding, H. Soo Han, J. Seong Kim, J. Hoon Park, S. Baek Park, H. Suk Jung, J.-K. Lee, and K. Sun Hong, Appl. Phys. Lett. 100, 084104 (2012). 10.1063/1.3684805
50. I. A. Ji, M.-J. Park, J.-Y. Jung, M. J. Choi, Y.-W. Lee, J.-H. Lee, and J. H. Bang, Bull. Korean Chem. Soc. 33, 2201 (2012). 10.5012/bkcs.2012.33.7.2200
51. G. Hodes, D. Cahen, and J. Manassen, Nature 260, 312 (1976). 10.1038/260312a0
52. K. M. H. Young and T. W. Hamann, Chem. Commun. 50, 8727 (2014). 10.1039/C4CC02598A