Controlled bipolar doping in Cu3N (100) thin films

Applied Physics Letters

Volumn 105, Issue 22, 2014, Pages

  Matsuzaki, Kosuke ^a   Okazaki, Tetsushi ^a   Lee, Yih Shu ^a   Hosono, Hideo ^a   Susaki, Tomofumi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE ABSORPTION; ENERGY CONVERSION; LIGHT ABSORPTION; METALLIC FILMS; MOLECULAR BEAM EPITAXY; SEMICONDUCTOR DOPING; SOLAR ENERGY; THIN FILMS;

CU-POOR; FLUX RATES; N-TYPE DOPING; OPTICAL ABSORPTION COEFFICIENTS; P AND N TYPES; P-TYPE DOPING; PHOTON ENERGY; PLASMA ASSISTED MOLECULAR BEAM EPITAXY;

COPPER;

EID: 84914100963     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4903069     Document Type: Article

References (27)

1. S. M. Sze, Semiconductor Devices: Physics and Technology, 2nd ed. (John Wiley & Sons, New York, 2002).
2. Handbook of Photovoltaic Science and Engineering, edited by A. Luque and S. Hegedus (John Wiley & Sons, New York, 2011).
3. S. Delbos, EPJ Photovoltaics 3, 35004 (2012). 10.1051/epjpv/2012008
4. C. Wadia, A. P. Alivisatos, and D. M. Kammen, Environ. Sci. Technol. 43, 2072 (2009). 10.1021/es8019534
5. T. K. Todorov, K. B. Reuter, and D. B. Mitzi, Adv. Mater. 22, E156 (2010). 10.1002/adma.200904155
6. J. L. Shay, S. Wagner, and H. M. Kasper, Appl. Phys. Lett. 27, 89 (1975). 10.1063/1.88372
7. A. Rothwarf and A. M. Barnett, IEEE Trans. Electron Devices 24, 381 (1977). 10.1109/T-ED.1977.18744
8. W. D. Gill, J. Appl. Phys. 41, 3731 (1970). 10.1063/1.1659500
9. T. Minami, Y. Nishi, T. Miyata, and J. Nomoto, Appl. Phys. Express 4, 062301 (2011). 10.1143/APEX.4.062301
10. J. Herion, E. A. Niekisch, and G. Scharl, Sol. Energy Mater. Sol. Cells 4, 101 (1980). 10.1016/0165-1633(80)90022-2
11. C. M. Caskey, R. M. Richards, D. S. Ginley, and A. Zakutayev, Mater. Horiz. 1, 424 (2014). 10.1039/c4mh00049h
12. A. Zakutayev, C. M. Caskey, A. N. Fioretti, D. S. Ginley, J. Vidal, V. Stevanovic, E. Tea, and S. Lany, J. Phys. Chem. Lett. 5, 1117 (2014). 10.1021/jz5001787
13. M. Yang, A. Zakutayev, J. Vidal, X. Zhang, D. S. Ginley, and F. J. DiSalvo, Energy Environ. Sci. 6, 2994 (2013). 10.1039/c3ee40621k
14. A. Zakutayev, A. J. Allen, X. Zhang, J. Vidal, Z. Cui, S. Lany, M. Yang, F. J. DiSalvo, and D. S. Ginley, Chem. Mater. 26, 4970 (2014). 10.1021/cm5018135
15. P. Jackson, D. Hariskos, E. Lotter, S. Paetel, R. Wuerz, R. Menner, W. Wischmann, and M. Powalla, Prog. Photovoltaics: Res. Appl. 19, 894 (2011). 10.1002/pip.1078
16. U. Zachwieja and H. Jacobs, J. Common Met. 161, 175 (1990). 10.1016/0022-5088(90)90327-G
17. T. Maruyama and T. Morishita, J. Appl. Phys. 78, 4104 (1995). 10.1063/1.359868
18. S. Terada, H. Tanaka, and K. Kubota, J. Cryst. Growth 94, 567 (1989). 10.1016/0022-0248(89)90038-9
19. T. Nosaka, M. Yoshitake, A. Okamoto, S. Ogawa, and Y. Nakayama, Thin Solid Films 348, 8 (1999). 10.1016/S0040-6090(98)01776-3
20. D. Wang, J. Vac. Sci. Technol. Vac. Surf. Films 16, 2084 (1998). 10.1116/1.581314
21. M. Asano, K. Umeda, and A. Tasaki, Jpn. J. Appl. Phys., Part 1 29, 1985 (1990). 10.1143/JJAP.29.1985
22. D. M. Borsa, S. Grachev, C. Presura, and D. O. Boerma, Appl. Phys. Lett. 80, 1823 (2002). 10.1063/1.1459116
23. A. Modin, K. O. Kvashnina, S. M. Butorin, L. Werme, J. Nordgren, S. Arapan, R. Ahuja, A. Fallberg, and M. Ottosson, J. Phys. Condens. Matter 20, 235212 (2008). 10.1088/0953-8984/20/23/235212
24. Z. Li and R. G. Gordon, Chem. Vap. Deposition 12, 435 (2006). 10.1002/cvde.200606485
25. S. Amoruso, V. Berardi, R. Bruzzese, R. Velotta, N. Spinelli, and X. Wang, Appl. Surf. Sci. 138, 250 (1999). 10.1016/S0169-4332(98)00402-4
26. D. M. Borsa and D. O. Boerma, Surf. Sci. 548, 95 (2004). 10.1016/j.susc.2003.10.053
27. U. Hahn and W. Weber, Phys. Rev. B 53, 12684 (1996). 10.1103/PhysRevB.53.12684