Effects of Si/Al ratio on the interaction of nonthermal plasma and Ag/HY catalysts

Applied Catalysis B: Environmental

Volumn 166-167, Issue , 2015, Pages 9-17

  Kim, Hyun Ha ^a   Teramoto, Yoshiyuki ^a   Sano, Taizo ^a   Negishi, Nobuaki ^a   Ogata, Atsushi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Nonthermal plasma; Plasma induced fluorescence; Si Al raito; VOC removal; Zeolite

Indexed keywords

ACTIVATED ALUMINA; ALUMINA; ELECTRON SPIN RESONANCE SPECTROSCOPY; FLUORESCENCE; MAGNETIC MOMENTS; POSITIVE IONS; ZEOLITES;

ELECTRON SPIN RESONANCE MEASUREMENTS; METALLIC STATE; NONTHERMAL PLASMA; OXYGEN PLASMAS; PLASMA ACTIVATION; PLASMA-INDUCED; SURFACE STREAMER; VOC REMOVAL;

CATALYST ACTIVITY;

EID: 84911387242     PISSN: 09263373     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apcatb.2014.11.008     Document Type: Article

References (74)

1. Neyts E.C., Bogaerts A. J. Phys. D: Appl. Phys. 2014, 47:224010.
2. Thevenet F., Sivachandiran L., Guaitella O., Barakat C., Rousseau A. J. Phys. D: Appl. Phys. 2014, 47:224011.
3. Chen H.L., Lee H.M., Chen S.H., Chang M.B., Yu S.J., Li S.N. Environ. Sci. Technol. 2009, 43:2216-2227.
4. Vandenbroucke A.M., Morent R., Geyter N.D., Leys C. J. Hazard. Mater. 2011, 195:30-54.
5. Kim H.H., Ogata A. Eur. Phys. J.: Appl. Phys. 2011, 55:13806.
6. Holzer F., Kopinke F.D., Roland U. Plasma Chem. Plasma Process. 2005, 25:595-611.
7. Chang C.L., Lin T.S. Plasma Chem. Plasma Process. 2005, 25:387-401.
8. Park M.K., Ryu S.G., Park H.B., Lee H.W., Hwang K.C., Lee C.H. Plasma Chem. Plasma Process. 2004, 24:117-135.
9. Magureanu M., Mandache N.B., Parvulescu V.I., Subrahmanyam C., Renken A., Kiwi-Minsker L. Appl. Catal. B: Environ. 2007, 74:270-277.
10. Kim H.H., Oh S.M., Ogata A., Futamura S. J. Adv. Oxid. Technol. 2005, 8:226-233.
11. Kim H.H., Kim J.H., Ogata A. Int. J. Plasma Environ. Sci. Technol. 2008, 2:106-112.
12. Kim H.H., Ogata A., Futamura S. Appl. Catal. B: Environ. 2008, 79:356-367.
13. Fan H.Y., Li X.S., Shi C., Zhao D.Z., Liu J.L., Liu Y.X., Zhu A.M. Plasma Chem. Plasma Process. 2011, 31:799-810.
14. Fan H.Y., Shi C.S., Li X.S., Zhao D.X., Xu Y., Zhu A.M. J. Phys. D: Appl. Phys. 2009, 42:225105.
15. Mok Y.S., Kim D.H. Curr. Appl. Phys. 2011, 11:S58-S62.
16. Dang X., Huang J., Cao L., Zhou Y. Catal. Commun. 2013, 40:116-119.
17. Zhao D.Z., Li X.S., Shi C., Fan H.Y., Zhu A.M. Chem. Eng. Sci. 2011, 66:3922-3929.
18. Subrenat A., Baléo J.N., Cloirec P.L., Blanc P.E. Carbon 2001, 39:707-716.
19. International Zeolite Association (IZA), . http://www.iza-structure.org/.
20. Ogata A., Ito D., Mizuno K., Kushiyama S., Yamamoto T. IEEE Trans. Ind. Appl. 2001, 37:959-964.
21. Oh S.M., Kim H.H., Einaga H., Ogata A., Futamura S., Park D.W. Thin Solid Films 2006, 506-507:418-422.
22. Oh S.M., Kim H.H., Ogata A., Einaga H., Futamura S., Park D.W. Catal. Lett. 2005, 99:101-104.
23. Kuroki T., Hirai K., Matsuoka S., Kim J.Y., Okubo M. IEEE Trans. Ind. Appl. 2011, 47:1916-1921.
24. Kuroki T., Hirai K., Kawabata R., Okubo M., Yamamoto T. IEEE Trans. Ind. Appl. 2010, 46:672-679.
25. Eliasson B., Liu C.-J., Kogelschatz U. Ind. Eng. Chem. Res. 2000, 39:1221-1227.
26. Zhang K., Eliasson B., Kogelschatz U. Ind. Eng. Chem. Res. 2002, 41:1462-1468.
27. Jiang T., Li Y., Liu C.-J., Xua G.-H., Eliasson B., Xue B.-Z. Catal. Today 2002, 72:229-235.
28. Liu C., Mallinson R., Lobban L. Appl. Catal. A: Gen. 1999, 178:17-27.
29. Yin A., Guo X., Dai W.L., Fan K. J. Phys. Chem. C 2010, 114.
30. Handbook of Zeolite Science and Technology 2003, Marcel Dekker Inc., New York. S.M. Auerbach, K.A. Carrado, P.K. Dutta (Eds.).
31. Kim H.H., Oh S.M., Ogata A., Futamura S. Catal. Lett. 2004, 96:189-194.
32. Sun T., Seff K. Chem. Rev. 1994, 94:857-870.
33. Hutson N.D., Reisner B.A., Yang R.T., Toby B.H. Chem. Mater. 2000, 12:3020-3031.
34. Wagner C.D., Riggs W.M., Davis L.E., Mouider J.F., Mullenberg G.E. Handbook of X-Ray Photoelectron Spectroscopy 1979, Perkin-Elmer Corporation Physical Electronics Division, MN.
35. Tjeng L.H., Meinders M.B.J., Elp J.v., Ghijsen J., Sawatzky G.A. Phys. Rev. B 1990, 41:3190-3199.
36. Jin M., Zhang X., Nishimoto S., Liu Z., Tryk D.A., Emeline A.V., Murakami T., Fujishima A. J. Phys. Chem. C 2007, 111:658-665.
37. Prieto P., Nistor V., Nouneh K., Oyama M., Abd-Lefdil M., Diaz R. Appl. Surf. Sci. 2012, 258:8807-8813.
38. Lei Y., Mehmood F., Lee S., Greeley J., Lee B., Seifert S., Winans R.E., Elam J.W., Meyer R.J., Redfern P.C., Teschner D., Schogl R., Pellin M.J., Curtiss L.A., Vajda S. Science 2010, 328:224-228.
39. Kang Y., Sun M., Li A. Catal. Lett. 2012, 142:1498-1504.
40. Jin L., Qian K., Jiang Z., Huang W. J. Mol. Catal. A: Chem. 2007, 274:95-100.
41. Baek S.-W., Kim J.-R., Ihm S.-K. Catal. Today 2004, 93-95:575-581.
42. Corro G., Pal U., Ayala E., Vidal E., Guilleminot E. Top. Catal. 2013, 56:467-472.
43. Nanba T., Masukawa S., Uchisawa J., Obuchi A. J. Catal. 2008, 259:250-259.
44. Kumar N., Konova P.M., Naydenov A., Teemu Catal. Lett. 2004, 98:57-60.
45. Sugasawa M., Ogata A. Ozone Sci. Eng. 2011, 33:158-163.
46. Zhang X.D., Qu Z.P., Li X.Y., Wen M., Quan X., Ma D., Wu J.J. Sep. Purif. Technol. 2010, 72:395-400.
47. Fujita H., Izumi J., Sagehashi M., Fujii T., Sakoda A. Water Res. 2004, 38:166-172.
48. Kim H.H., Kim J.H., Ogata A. J. Phys. D: Appl. Phys. 2009, 42:135210.
49. Mizuno A., Yamazaki Y., Obama S., Suzuki E., Okazaki K. IEEE Trans. Ind. Appl. 1993, 29:262-267.
50. Mizuno A., Ito H. J. Electrostat. 1990, 25:97-107.
51. Mizuno A., Yamazaki Y., Ito H., Yoshida H. IEEE Trans. Ind. Appl. 1992, 28:535-540.
52. Takaki K., Chang J.S., Kostov K.G. IEEE Trans. Dielectr. Electr. Insul. 2004, 11:481-490.
53. Kuronen M., Harjula R., Jernstrom J., Vestenius M., Lehto J. Phys. Chem. Chem. Phys. 2000, 2:2655-2659.
54. Li Z., Johnson M.C., Sun M., Ryan E.T., Earl D.J., Maichen W., Martin J.I., Li S., Lew C.M., Wang J., Deem M.W., Davis M.E., Yan Y. Angew. Chem. Int. Ed. 2006, 45:6329-6332.
55. Clarkson R.B., Cirillo J.A.C. J. Catal. 1974, 33:392-401.
56. Kasai P.H. J. Chem. Phys. 1965, 43:3322-3327.
57. Kanzaki N., Yasumori I. J. Phys. Chem. 1978, 82:2351-2352.
58. Abou-Kais A., Vedrine J.C., Naccache C. J. Chem. Soc. Faraday Trans. II 1978, 74:959-967.
59. Michalik J., Pol A.v.d., Reijerse E.J., Wasowicz T., Boer E.d. Appl. Magn. Reson. 1992, 3:19-35.
60. Akdogan Y., Vogt C., Bauer M., Bertagnolli H., Giurgiu L., Roduner E. Phys. Chem. Chem. Phys. 2008, 10:2952-2963.
61. Schoonheydt R.A., Leeman H. J. Phys. Chem. 1989, 93:2048-2053.
62. Teramoto Y., Kim H.H., Ogata A., Negishi N. IEEE Trans. Plasma Sci. 2014, 32(10):2850-2851.
63. Cremer G.D., Coutino-Gonzalez E., Roeffaers M.B.J., Moens B., Ollevier J., Auweraer M.v.d., Schoonheydt R., Jacobs P.A., Schryver F.C.D., Hofkens J., Vos D.E.d., Sels B.F., Vosch T. J. Am. Chem. Soc. 2009, 131:3049-3056.
64. Peyser L.A., Vinson A.E., Bartko Andrew P., Dickson R.M. Science 2001, 291:103-106.
65. Matsuoka M., Matsuda E., Tsuji K., Yamashita H., Anpo M. J. Mol. Catal. A: Chem. 1996, 107:399-403.
66. Herron N., Wang Y., Eddy M.M., Stucky G.D., Cox D.E., Moller K., Bein T. J. Am. Chem. Soc. 1989, 111:530-540.
67. Gole J.L., Woodward R., Hayden J.S., Dixon D.A. J. Phys. Chem. 1985, 89:4905-4908.
68. Yamamoto T., Takenaka S., Tanaka T., Baba T. J. Phys.: Conf. Ser. 2009, 190:012171.
69. Kim H.H., Ogata A., Schiorlin M., Marotta E., Paradisi C. Catal. Lett. 2011, 141:277-282.
70. Teramoto Y., Kim H.H., Ogata A., Negishi N. Catal. Lett. 2013, 143:1374-1378.
71. Shibata J., Takada Y., Shichi A., Satokawa S., Satsuma A., Hattori T. Appl. Catal. B: Environ. 2004, 54:137-144.
72. Ogata A., Kim H.H., Futamura S., Kushiyama S., Mizuno K. Appl. Catal. B: Environ. 2004, 53:175-180.
73. Liu C.J., Zou J., Yu K., Cheng D., Han Y., Zhan J., Ratanatawanate C., Jang B.W.L. Pure Appl. Chem. 2006, 78:1227-1238.
74. Liu C.J., Zhao Y., Li Y., Zhang D.S., Chang Z., BU W.H. ACS Sustain. Chem. Eng. 2013, 2:3-13.