Plasma catalytic oxidation of stored benzene in a cycled storage-discharge (csd) process: Catalysts, reactors and operation conditions

Plasma Chemistry and Plasma Processing

Volumn 31, Issue 6, 2011, Pages 799-810

  Fan, Hong Yu ^a   Li, Xiao Song ^a   Shi, Chuan ^a   Zhao, De Zhi ^a   Liu, Jing Lin ^a   Liu, Yan Xia ^a   Zhu, Ai Min ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Ag HZSM 5 catalyst; Benzene removal; Dielectric barrier discharge (DBD); Plasma catalysis

Indexed keywords

BENZENE; BENZENE REFINING; CARBON DIOXIDE; CATALYSTS; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; OXIDATION; PLASMA APPLICATIONS; POLLUTION;

AG/HZSM-5 CATALYSTS; BENZENE REMOVAL; DIELECTRIC BARRIER DISCHARGES; OPERATING CONDITION; OPERATION CONDITIONS; PLASMA CATALYSIS; PLASMA CATALYTIC REACTORS; REACTOR CONFIGURATION;

CATALYTIC OXIDATION;

EID: 84855856289     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-011-9320-5     Document Type: Article

References (29)

1. Harling M, Demidyuk V, Fischer SJ, Whitehead JC (2008) Appl Catal B Environ 82:180-189
2. Subrahmanyam C, Magureanu A, Renken A, Kiwi-Minsker L (2006) Appl Catal B Environ 65:150-156
3. Nunez CM, Ramsey GH, Ponder WH, Abbott JH, Hamel LE, Kariher PH (1993) Air Waste 43:242-247
4. Harling AM, Glover DJ, Whitehead JC, Zhang K (2008) Environ Sci Technol 42:4546-4550
5. Harada N, Matsuyama T, Yamamoto H (2007) J Electrostat 65:43-53
6. Morent R, Leys C, Dewulf J, Neirynck D, Van Durme J, Van Langenhove H (2007) J Adv Oxid Technol 10:127-136
7. Van Durme J, Dewulf J, Leys C, Van Langenhove H (2008) Appl Catal B Environ 78:324-333
8. Chen HL, Lee HM, Chen SH, Chang MB (2008) Ind Eng Chem Res 47:2122-2130
9. Chen HL, Lee HM, Chen SH, Chang MB, Yu SJ, Li SN (2009) Environ Sci Technol 43:2216-2227
10. Yan XF, Hu Z (2004) Plasma Sci Technol 6:2241-2246
11. Ogata A, Ito D, Mizuno K, Kushiyama S, Gal A, Yamamoto T (2002) Appl Catal A Gen 236:9-15
12. Kim HH, Kobara H, Ogata A, Futamura S (2005) IEEE Trans Ind Appl 41:206-214
13. Rubio SJ, Rodero A, Quintero MC (2008) Plasma Chem Plasma Process 28:415-428
14. Marotta E, Schiorlin M, Rea M, Paradisi C (2010) J Phys D Appl Phys 43:124011
15. Magureanu M, Mandache NB, Eloy P, Gaigneaux EM, Parvulescu VI (2005) Appl Catal B Environ 61:12-20
16. Kuroki T, Fujioka T, Kawabata R, Okubo M, Yamamoto T (2009) IEEE Trans Ind Appl 45:10-15
17. Martin L, Ognier S, Gasthauer E, Cavadias S, Dresvin S, Amouroux J (2008) Energ Fuel 22:576-582
18. Kim HH, Oh SM, Ogata A, Futamura S (2005) J Adv Oxid Technol 8:226-233
19. Fan HY, Shi C, Li XS, Zhao DZ, Xu Y, Zhu AM (2009) J Phys D Appl Phys 42:225105
20. Yang RT, Killinides ES (1995) AICHE J 41:509-517
21. Yang FH, Hernandez-Maldonado AJ, Yang RT (2004) Sep Sci Technol 39:1717-1732
22. Ding HX, Zhu AM, Lu FG, Xu Y, Zhang J, Yang XF (2006) J Phys D Appl Phys 39:3603-3608
23. Cvetanovic RJ (1987) J Phys Chem 16:261-326
24. Kim HH, Ogata A, Futamura S (2008) Appl Catal B Environ 79:356-367
25. Toby S, Van De Burgt LJ, Toby FS (1985) J Phys Chem 89:1982-1986
26. Ogata A, Shintani N, Yamanouchi K, Mizuno K, Kushiyama S, Yamamoto T (2000) Plasma Chem Plasma Process 20:453-467
27. Guo YF, Ye DQ, Chen KF, Tian YF (2006) Plasma Chem Plasma Process 26:237-249
28. Kim HH, Ogata A, Futamura S (2005) J Phys D Appl Phys 38:1292-1300
29. Ogata A, Miyamae K, Mizuno K, Kushiyama S, Tezuka M (2002) Plasma Chem Plasma Process 22:537-552