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Volumn , Issue , 2003, Pages 315-318

Self-aligned 0.12μm T-gate In.53Ga.47As/In.52A1.48As HEMT technology utilising a non-annealed ohmic contact strategy

Author keywords

[No Author keywords available]

Indexed keywords

HEMT TECHNOLOGIES; SELF-ALIGNED;

EID: 84907687310     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2003.1256877     Document Type: Conference Paper
Times cited : (19)

References (9)
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    • (2002) Solid-State Electron , vol.46 , pp. 631-638
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  • 4
    • 84907815610 scopus 로고    scopus 로고
    • RF analysis of aggressively scaled pHEMTs
    • ed. by W. A. Lane, G. M. Crean, F. A. McCabe and H. Grunbacher, Cork, Ireland
    • K. Kalna, S. Roy, A. Asenov, K. Elgaid, and I. Thayne, "RF analysis of aggressively scaled pHEMTs", in Proceedings of ESSDERC 2000, ed. by W. A. Lane, G. M. Crean, F. A. McCabe and H. Grunbacher, Cork, Ireland (2000) 156-159.
    • (2000) Proceedings of ESSDERC 2000 , pp. 156-159
    • Kalna, K.1    Roy, S.2    Asenov, A.3    Elgaid, K.4    Thayne, I.5
  • 5
    • 0024699745 scopus 로고
    • Importance of source and drain resistance to the maximum fT of millimeter-wave MODFET's
    • P.J. Tasker, B. Hughes, "Importance of source and drain resistance to the maximum fT of millimeter-wave MODFET's", IEEE Electron Device Letters 10 (7) (1989)291-293.
    • (1989) IEEE Electron Device Letters , vol.10 , Issue.7 , pp. 291-293
    • Tasker, P.J.1    Hughes, B.2
  • 6
    • 0035247262 scopus 로고    scopus 로고
    • Characteristics and comparison of In0.49Ga0.51P/InGaAs single and double-delta doped pseudomorphic high electron mobility transistors
    • K. W. Lin, K. H. Yu, W. L. Chang, C. C. Cheng, K. P. Lin, C. H. Yen, W. S. Lour, and W. C. Liu, "Characteristics and comparison of In0.49Ga0.51P/InGaAs single and double-delta doped pseudomorphic high electron mobility transistors", Solid-State Electron. 45 (2001) 309-314.
    • (2001) Solid-State Electron , vol.45 , pp. 309-314
    • Lin, K.W.1    Yu, K.H.2    Chang, W.L.3    Cheng, C.C.4    Lin, K.P.5    Yen, C.H.6    Lour, W.S.7    Liu, W.C.8
  • 7
    • 0013447503 scopus 로고    scopus 로고
    • Multiple delta doping in aggres-sively scaled PHEMTs
    • ed. by H. Ryssel, G. Wachutka, and H. Grunbacher
    • K. Kalna and A. Asenov, "Multiple delta doping in aggres-sively scaled PHEMTs", in Proc, ESSDERC 2001, ed. by H. Ryssel, G. Wachutka, and H. Grunbacher (2001) 380-384.
    • (2001) Proc, ESSDERC 2001 , pp. 380-384
    • Kalna, K.1    Asenov, A.2
  • 8
    • 84907707481 scopus 로고    scopus 로고
    • Novel technologies for the realisation of GaAs pHEMTs with 120 nm self-aligned and nano-imprinted T-gates
    • (in process of publication)
    • D. Moran, E. Boyd, H. McLelland, K. Elgaid. Y. Chen, D. S. Macintyre, S. Thorns, C. R. Stanley, and I. G. Thayne, "Novel technologies for the realisation of GaAs pHEMTs with 120 nm self-aligned and nano-imprinted T-gates", in Proc. MNE 2002 (in process of publication).
    • (2002) Proc. MNE
    • Moran, D.1    Boyd, E.2    McLelland, H.3    Elgaid, K.4    Chen, Y.5    Macintyre, D.S.6    Thorns, S.7    Stanley, C.R.8    Thayne, I.G.9
  • 9
    • 0030287906 scopus 로고    scopus 로고
    • A simple approach to include external resistances in the Monte Carlo simulation of MESFETs and HEMTs
    • S. Babiker, A. Asenov, N. Cameron, and S. P. Beaumont, "A simple approach to include external resistances in the Monte Carlo simulation of MESFETs and HEMTs", IEEE Trans. Electron Devices 43 (1996) 2032-2034.
    • (1996) IEEE Trans. Electron Devices , vol.43 , pp. 2032-2034
    • Babiker, S.1    Asenov, A.2    Cameron, N.3    Beaumont, S.P.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.