Characterization of fast photoelectron packets in weak and strong laser fields in ultrafast electron microscopy

Ultramicroscopy

Volumn 146, Issue , 2014, Pages 97-102

  Plemmons, Dayne A ^a   Tae Park, Sang ^b   Zewail, Ahmed H ^b   Flannigan, David J ^a  

^a University of Minnesota   (United States)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Instrument response function; Photon induced near field electron microscopy; Ultrafast electron microscopy

Indexed keywords

ELECTRON EMISSION; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; PHOTOELECTRONS; PROBES;

FEMTOSECOND REGIMES; IN-SITU CHARACTERIZATION; INSTRUMENT RESPONSE FUNCTIONS; NEAR-FIELD; NONLINEAR PROCESS; STRONG LASER FIELD; TEMPORAL RESOLUTION; ULTRAFAST ELECTRON MICROSCOPY;

PHOTONS;

ANALYTICAL PARAMETERS; ARTICLE; ARTIFACT REDUCTION; ELECTRON MICROSCOPY; ELECTRON PACKETS; ELECTRON RADIATION; ELECTRON TRANSPORT; ENERGY TRANSFER; LASER; MEASUREMENT; PHOTON; PHOTON INDUCED NEAR FIELD EFFECT; QUANTITATIVE ANALYSIS; ULTRAFAST ELECTRON MICROSCOPY; ZERO LOSS PEAK; ACCURACY; CALCULATION; ELECTRON; ELECTRON BEAM; ILLUMINATION; IMAGE ANALYSIS; IMAGE QUALITY; MATHEMATICAL ANALYSIS; PROBABILITY;

EID: 84907141948     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2014.08.001     Document Type: Article

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