The role of plasma treatment on electrochemical capacitance of undoped and nitrogen doped carbon nanotubes

Nanomaterials and Energy

Volumn 2, Issue 2, 2013, Pages 71-81

  Shi, W ^a   Venkatachalam, K ^b,c   Gavalas, V ^b,d   Qian, D ^b   Andrews, R ^b,e   Bachas, L G ^b,f   Chopra, N ^a,g  

^a University of Alabama   (United States)

^b UNIVERSITY OF KENTUCKY   (United States)

^c Innopharma Inc   (United States)

^d Medicon Hellas   (Greece)

^e UNIVERSITY OF KENTUCKY   (United States)

^f University of Miami   (United States)

^g UNIVERSITY OF ALABAMA   (United States)

Author keywords

Acid oxidation; Capacitors; Carbon nanotubes; Electrochemistry; Nitrogen doping; Plasma; Raman spectroscopy

Indexed keywords

CAPACITANCE; CAPACITORS; CHEMICAL VAPOR DEPOSITION; CYCLIC VOLTAMMETRY; DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; ELECTROLYTES; IRON COMPOUNDS; NITRIC ACID; NITROGEN; NITROGEN PLASMA; ORGANOMETALLICS; PLASMA APPLICATIONS; PLASMAS; RAMAN SPECTROSCOPY; SYNTHESIS (CHEMICAL);

CHEMICAL VAPOR DEPOSITION METHODS; ELECTROCHEMICAL CAPACITANCE; ELECTROCHEMICAL SURFACE AREA; IMPLANTABLE BIOMEDICAL DEVICES; NITROGEN DOPED CARBON NANOTUBES; NITROGEN-DOPING; SPECTROSCOPIC TECHNIQUE; SUPPLEMENTARY INFORMATION;

CARBON NANOTUBES;

EID: 84905639414     PISSN: 20459831     EISSN: 2045984X     Source Type: Journal    
DOI: 10.1680/nme.12.00033     Document Type: Article

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