Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing

Light: Science and Applications

Volumn 3, Issue , 2014, Pages

  Yang, Jing ^a,b   Luo, Fangfang ^a   Kao, Tsung Sheng ^a   Li, Xiong ^c   Ho, Ghim Wei ^a   Teng, Jinghua ^b   Luo, Xiangang ^c   Hong, Minghui ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^c INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

anti reflection; broadband; laser micro nanoprocessing; surface plasmons

Indexed keywords

ASPECT RATIO; FABRICATION; LIGHT REFLECTION; LITHOGRAPHY; NANOWIRES; OPTICAL WAVEGUIDES; OPTOELECTRONIC DEVICES; PLASMONS; REFLECTION; REFRACTIVE INDEX; SURFACE PLASMON RESONANCE;

ANTI REFLECTION; BROADBAND; BROADBAND ANTI REFLECTIONS; LASER INTERFERENCE LITHOGRAPHY; LIGHT COLLECTION EFFICIENCY; METAL-ASSISTED CHEMICAL ETCHING; SUB-WAVELENGTH STRUCTURES; SURFACE PLASMONS;

SILICON;

EID: 84903987996     PISSN: None     EISSN: 20477538     Source Type: Journal    
DOI: 10.1038/lsa.2014.66     Document Type: Article

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