Electrochemical deposition and microstructure of copper (I) oxide films

Scripta Materialia

Volumn 38, Issue 11, 1998, Pages 1731-1738

  Zhou, Yanchun ^a   Switzer, Jay A ^b  

^a INSTITUTE OF METAL RESEARCH   (China)

^b MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; ELECTRIC POTENTIAL; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; FILM GROWTH; GRAIN SIZE AND SHAPE; MORPHOLOGY; ORGANOMETALLICS; PH EFFECTS; TEXTURES; THIN FILMS;

COPPER LACTATE; LINE INTERCEPT METHOD; SATURATED CALOMEL ELECTRODES; SOFTWARE PACKAGE CERIUS;

COPPER OXIDES;

EID: 0032485633     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(98)00091-8     Document Type: Article

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