Computational lithography platform for 193i-guided directed self-assembly

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9052, Issue , 2014, Pages

  Lai, Kafai ^a   Ozlem, Melih ^a   Pitera, Jed W ^c   Liu, Chi Chun ^b   Schepis, Anthony ^b   Dechene, Daniel ^a   Krasnoperova, Azalia ^a   Brue, Daniel ^a   Abdallah, Jassem ^b   Tsai, Hsinyu ^a   Guillorn, Mike ^a   Cheng, Joy ^c   Doerk, Gregory ^c   Tjio, Melia ^c   Topalogu, Rasit ^a   Fahkry, Moutaz ^a   Lafferty, Neal ^a  

^a IBM RESEARCH   (United States)

^b IBM   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Compact model; Computational Lithography; Directed Self Assembly; DSA model; Lithography Optimization; Mask Decomposition; Optical extension; Optical Lithography; Optical Proximity Correction; Source Mask Optimization

Indexed keywords

PHASE INTERFACES; PHOTOLITHOGRAPHY; SELF ASSEMBLY;

COMPACT MODEL; COMPUTATIONAL LITHOGRAPHIES; DIRECTED SELF-ASSEMBLY; LITHOGRAPHY OPTIMIZATION; OPTICAL EXTENSION; OPTICAL PROXIMITY CORRECTIONS; SOURCE-MASK OPTIMIZATIONS;

MATHEMATICAL MODELS;

EID: 84901777756     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2046920     Document Type: Conference Paper

References (12)

1. Kafai Lai, Chi-Chun Liu, Jed Pitera, Daniel J. Dechene, Anthony Schepis, Jassem Abdallah, Hsinyu Tsai, Michael Guillorn, Joy Cheng, Gregory S. Doerk, Melia Tjio, Charles Rettner, Olalekan Odesanya, Melih Ozlem, Neal Lafferty, "Computational aspects of optical lithography extension by directed self assembly", Proc. SPIE vol. 8683, 868304, 2013
2. Chi-Chun Liu, Jed Pitera, Neal Lafferty, Kafai Lai, Charles Rettner, Melia Tjio, Noel Arellano, Joy Cheng, "Progress towards the integration of optical proximity correction and directed self-assembly of blocks copolymers with graphoepitaxy", Proc. SPIE vol.8323, 83230X, 2012
3. Hsin-Yu Tsai, Michael Guillorn, Gregory Doerk, Joy Cheng, Daniel Sanders, Kafai Lai, Chi-Chun Liu and Matthew Colburn, "Directed self-assembly for ever-smaller printed circuits", SPIE newsroom, http://spie.org/x93535. xmlhighlight=x2402&ArticleID=x93535
4. Chris Bencher, Jeffrey Smith, Liyan Miao, Cathy Cai, Yongmei Chen, Joy Y. Cheng, Daniel P. Sanders, Melia Tjio, Hoa D. Truong, Steven Holmes, William D. Hinsberg, "Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab", Proc. SPIE vol 7970, 79700F, 2011
5. Benjamen Rathsack, Mark Somervell, Josh Hooge, Makoto Muramatsu, Keiji Tanouchi, Takahiro Kitano, Eiichi Nishimura, Koichi Yatsuda, Seiji Nagahara, Iwaki Hiroyuki, Keiji Akai, Takashi Hayakawa, "Pattern scaling with directed self assembly through lithography and etch process integration", Proc. SPIE, vol. 8323, 83230B, 2012
6. Katsuyoshi Kodera, Hironobu Sato, Yoshihiro Naka, Hiroki Yonemitsu, Hideki Kanai, Shimon Maeda, Satoshi Tanaka, Shoji Mimotogi, Hirokazu Kato, Masahiro Kanno, Yuusuke Kasahara, Hitoshi Kubota, Katsutoshi Kobayashi, Ayako Kawanishi, Yuriko Seino and Tsukasa Azuma, "DSA lithography modeling and process optimization based on dissipative particle dynamics method", presented in International Microporcess and Nanopatterning Conference 2013, Sapporo, Japan, Nov., 2013
7. Tatsuhiro Iwama, et al, "Computational Studies of Defectivity in Directed Self-Assembly", presented in International Microporcess and Nanopatterning Conference 2013, Sapporo, Japan, Nov., 2013
8. Xingkun Man, David Andelamn, Henri Orland, "Block Copolymer Films with Free Interfaces: Ordering by Nanopatterned Substrates", Phys. Rev. E (Rapid Communication) 86, 010801 (2012)
9. F. A. Detcheverry, D. Q. Pike, P. F. Nealey, M. Muller, and J. J. de Pablo, "Monte Carlo Simulation of Coarse Grain Polymeric Systems," Physical Review Letters, vol. 102, May 2009.
10. Glenn Fredrickson, The equilibrium theory of inhomogeneous polymers: Clarendon Press, 2006.
11. M. W. Matsen and F. S. Bates, "Unifying weak-and strong-segregation block copolymer theories" Macromolecules, vol. 29, pp. 1091-1098, Feb 1996.
12. Thuc Dam, 'Applying ILT mask synthesis for co-optimizing design rules and DSA process parameters", Proc. SPIE, vol. 9052, 905247, 2013