SCOPUS 정보 검색 플랫폼

Review of Scientific Instruments

Volumn 85, Issue 5, 2014, Pages

Atmospheric pressure plasma jet with high-voltage power supply based on piezoelectric transformer

(5) Babij, Michał a Kowalski, Zbigniew W a Nitsch, Karol a Silberring, Jerzy b Gotszalk, Teodor a

a WROCLAW UNIVERSITY OF TECHNOLOGY (Poland)

b AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

IONIZATION; MASS SPECTROMETRY; PIEZOELECTRIC DEVICES; POWER CONVERTERS;

AMBIENT MASS SPECTROMETRIES; ATMOSPHERIC PRESSURE PLASMA JETS; DIELECTRIC BARRIER DISCHARGE PLASMAS; HIGH VOLTAGE POWER SUPPLY; ION MOBILITY SPECTROMETRY; LOW TEMPERATURE PLASMAS; NONTHERMAL ATMOSPHERIC PRESSURE PLASMAS; PIEZOELECTRIC TRANSFORMERS;

PLASMA JETS;

EID: 84900014600 PISSN: 00346748 EISSN: 10897623 Source Type: Journal
DOI: 10.1063/1.4874317 Document Type: Article

Times cited : (16)

References (44)

1
- 76749096901
- 10.1063/1.3310024
- S. A. Starostin, P. A. Premkumar, M. Creatore, H. de Vries, R. M. J. Paffen, and M. C. M. van de Sanden, Appl. Phys. Lett. 96, 061502 (2010). 10.1063/1.3310024
- (2010) Appl. Phys. Lett. , vol.96 , pp. 061502
- Starostin, S.A.¹ Premkumar, P.A.² Creatore, M.³ De Vries, H.⁴ Paffen, R.M.J.⁵ Van De Sanden, M.C.M.⁶

2
- 77951025730
- 10.1109/TPS.2010.2042078
- S. A. Fernández-Gutierrez, P. D. Pedr, M. J. Pitts, and J. Powers, IEEE Trans. Plasma Sci. 38, 957 (2010). 10.1109/TPS.2010.2042078
- (2010) IEEE Trans. Plasma Sci. , vol.38 , pp. 957
- Fernández-Gutierrez, S.A.¹ Pedr, P.D.² Pitts, M.J.³ Powers, J.⁴

3
- 84857507321
- 10.1002/ijc.26252
- M. Vandamme, E. Robert, S. Lerondel, V. Sarron, D. Ries, S. Dozias, J. Sobilo, D. Gosset, C. Kieda, B. Legrain, J.-M. Pouvesle, and A. le Pape, Int. J. Cancer 130, 2185 (2012). 10.1002/ijc.26252
- (2012) Int. J. Cancer , vol.130 , pp. 2185
- Vandamme, M.¹ Robert, E.² Lerondel, S.³ Sarron, V.⁴ Ries, D.⁵ Dozias, S.⁶ Sobilo, J.⁷ Gosset, D.⁸ Kieda, C.⁹ Legrain, B.¹⁰ Pouvesle, J.-M.¹¹ Le Pape, A.¹²

4
- 0032306958
- 10.1109/27.747887
- A. Schütze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, and R. F. Hicks, IEEE Trans. Plasma Sci. 26, 1685 (1998). 10.1109/27.747887
- (1998) IEEE Trans. Plasma Sci. , vol.26 , pp. 1685
- Schütze, A.¹ Jeong, J.Y.² Babayan, S.E.³ Park, J.⁴ Selwyn, G.S.⁵ Hicks, R.F.⁶

5
- 0037023121
- 10.1016/S0584-8547(01)00406-2
- A. Bogaerts, E. Neyts, R. Gijbels, and J. van der Mullen, Spectrochim. Acta, Part B 57, 609 (2002). 10.1016/S0584-8547(01)00406-2
- (2002) Spectrochim. Acta, Part B , vol.57 , pp. 609
- Bogaerts, A.¹ Neyts, E.² Gijbels, R.³ Van Der Mullen, J.⁴

6
- 78650644469
- V. Nehra, A. Kumar, and H. K. Dwivedi, Int. J. Eng. 2, 53 (2007).
- (2007) Int. J. Eng. , vol.2 , pp. 53
- Nehra, V.¹ Kumar, A.² Dwivedi, H.K.³

7
- 70350648238
- 10.1088/0022-3727/42/20/202002
- W.-C. Zhu, Q. Li, X.-M. Zhu, and Y.-K. Pu, J. Phys. D: Appl. Phys. 42, 202002 (2009). 10.1088/0022-3727/42/20/202002
- (2009) J. Phys. D: Appl. Phys. , vol.42 , pp. 202002
- Zhu, W.-C.¹ Li, Q.² Zhu, X.-M.³ Pu, Y.-K.⁴

8
- 70349627033
- 10.1007/s00216-009-2799-4
- J. Franzke, Anal. Bioanal. Chem. 395, 549 (2009). 10.1007/s00216-009- 2799-4
- (2009) Anal. Bioanal. Chem. , vol.395 , pp. 549
- Franzke, J.¹

9
- 67651146775
- 10.1109/TDEI.2009.5128513
- E. Panousis, N. Merbahi, F. Clement, M. Yousfi, J. F. Loiseau, O. Eichwald, and B. Held, IEEE Trans. Dielectr. Elect. Insul. 16, 734 (2009). 10.1109/TDEI.2009.5128513
- (2009) IEEE Trans. Dielectr. Elect. Insul. , vol.16 , pp. 734
- Panousis, E.¹ Merbahi, N.² Clement, F.³ Yousfi, M.⁴ Loiseau, J.F.⁵ Eichwald, O.⁶ Held, B.⁷

10
- 67650281495
- 10.1109/TPS.2009.2014871
- E. Panousis, N. Merbahi, F. Clément, A. Ricard, M. Yousfi, L. Papageorghiou, J.-F. Loiseau, O. Eichwald, B. Held, and N. Spyrou, IEEE Trans. Plasma Sci. 37, 1004 (2009). 10.1109/TPS.2009.2014871
- (2009) IEEE Trans. Plasma Sci. , vol.37 , pp. 1004
- Panousis, E.¹ Merbahi, N.² Clément, F.³ Ricard, A.⁴ Yousfi, M.⁵ Papageorghiou, L.⁶ Loiseau, J.-F.⁷ Eichwald, O.⁸ Held, B.⁹ Spyrou, N.¹⁰

11
- 80455156376
- 10.1109/TIE.2011.2126536
- R. Díez, H. Piquet, M. Cousineau, and S. Bhosle, IEEE Trans. Indus. Electron. 59, 1912 (2012). 10.1109/TIE.2011.2126536
- (2012) IEEE Trans. Indus. Electron. , vol.59 , pp. 1912
- Díez, R.¹ Piquet, H.² Cousineau, M.³ Bhosle, S.⁴

12
- 84861186673
- 10.1109/TIM.2012.2188351
- M. Amjad, Z. Salam, M. Facta, and K. Ishaque, IEEE Trans. Instrum. Meas. 61, 1676 (2012). 10.1109/TIM.2012.2188351
- (2012) IEEE Trans. Instrum. Meas. , vol.61 , pp. 1676
- Amjad, M.¹ Salam, Z.² Facta, M.³ Ishaque, K.⁴

13
- 55849133398
- 10.1063/1.3020223
- A. Shashurin, M. Keidar, S. Bronnikov, R. A. Jurjus, and M. A. Stepp, Appl. Phys. Lett. 93, 181501 (2008). 10.1063/1.3020223
- (2008) Appl. Phys. Lett. , vol.93 , pp. 181501
- Shashurin, A.¹ Keidar, M.² Bronnikov, S.³ Jurjus, R.A.⁴ Stepp, M.A.⁵

14
- 73849135570
- 10.1063/1.3272089
- Y. C. Hong, W. S. Kang, Y. B. Hong, W. J. Yi, and H. S. Uhm, Phys. Plasmas 16, 123502 (2009). 10.1063/1.3272089
- (2009) Phys. Plasmas , vol.16 , pp. 123502
- Hong, Y.C.¹ Kang, W.S.² Hong, Y.B.³ Yi, W.J.⁴ Uhm, H.S.⁵

15
- 80051548668
- 10.1016/j.tsf.2010.11.057
- Y. S. Seo, H. W. Lee, H. C. Kwon, J. Choi, S. M. Lee, K. C. Woo, K. T. Kim, and J. K. Lee, Thin Solid Films 519, 7071 (2011). 10.1016/j.tsf.2010.11.057
- (2011) Thin Solid Films , vol.519 , pp. 7071
- Seo, Y.S.¹ Lee, H.W.² Kwon, H.C.³ Choi, J.⁴ Lee, S.M.⁵ Woo, K.C.⁶ Kim, K.T.⁷ Lee, J.K.⁸

16
- 71549130728
- 10.1016/j.sab.2009.10.001
- S. B. Olenici-Craciunescu, A. Michels, C. Meyer, R. Heming, S. Tombrink, W. Vautz, and J. Franzke, Spectrochim. Acta, Part B 64, 1253 (2009). 10.1016/j.sab.2009.10.001
- (2009) Spectrochim. Acta, Part B , vol.64 , pp. 1253
- Olenici-Craciunescu, S.B.¹ Michels, A.² Meyer, C.³ Heming, R.⁴ Tombrink, S.⁵ Vautz, W.⁶ Franzke, J.⁷

17
- 79957806746
- 10.1016/j.sab.2011.03.005
- S. B. Olenici-Craciunescu, S. Müller, A. Michels, V. Horvatic, C. Vadla, and J. Franzke, Spectrochim. Acta, Part B 66, 268 (2011). 10.1016/j.sab.2011.03.005
- (2011) Spectrochim. Acta, Part B , vol.66 , pp. 268
- Olenici-Craciunescu, S.B.¹ Müller, S.² Michels, A.³ Horvatic, V.⁴ Vadla, C.⁵ Franzke, J.⁶

18
- 33646347626
- 10.1088/0963-0252/15/2/S07
- H. Itoh, K. Teranishi, and S. Suzuki, Plasma Sources Sci. Technol. 15, S51 (2006). 10.1088/0963-0252/15/2/S07
- (2006) Plasma Sources Sci. Technol. , vol.15
- Itoh, H.¹ Teranishi, K.² Suzuki, S.³

19
- 68349090157
- 10.1051/epjap/2009083
- A. Brockhaus, R. Sauerbier, and J. Engemann, Eur. Phys. J. Appl. Phys. 47, 22809 (2009). 10.1051/epjap/2009083
- (2009) Eur. Phys. J. Appl. Phys. , vol.47 , pp. 22809
- Brockhaus, A.¹ Sauerbier, R.² Engemann, J.³

20
- 71549133999
- 10.1063/1.3267142
- H. Kim, A. Brockhaus, and J. Engemann, Appl. Phys. Lett. 95, 211501 (2009). 10.1063/1.3267142
- (2009) Appl. Phys. Lett. , vol.95 , pp. 211501
- Kim, H.¹ Brockhaus, A.² Engemann, J.³

21
- 84900019923
- Kyoto, Japan, No. 27A-a4
- M. Teschke and J. Engemann, ISPC 18th, Kyoto, Japan, No. 27A-a4 (2007).
- (2007) ISPC 18th
- Teschke, M.¹ Engemann, J.²

22
- 84900035560
- ICOPS 2008, in, 15-19 June
- M. Teschke and J. Engemann, ICOPS 2008, in Proceedings of the 35th IEEE International Conference on Plasma Science, 15-19 June 2008.
- (2008) Proceedings of the 35th IEEE International Conference on Plasma Science
- Teschke, M.¹ Engemann, J.²

23
- 76849108435
- 10.1002/ctp200910065
- M. Teschke and J. Engemann, Contrib. Plasma Phys. 49, 614 (2009). 10.1002/ctpp.200910065
- (2009) Contrib. Plasma Phys. , vol.49 , pp. 614
- Teschke, M.¹ Engemann, J.²

24
- 84857377281
- 10.1109/TPEL.2011.2171007
- Y. Yuanmao, K. W. E. Cheng, and K. Ding, IEEE Trans. Power Electron. 27, 1926 (2012). 10.1109/TPEL.2011.2171007
- (2012) IEEE Trans. Power Electron. , vol.27 , pp. 1926
- Yuanmao, Y.¹ Cheng, K.W.E.² Ding, K.³

25
- 0035121244
- 10.1016/S0924-4247(00)00495-7
- J. H. Hu, H. L. Li, H. L. W. Chan, and C. L. Choy, Sens. Actuators, A 88, 79 (2001). 10.1016/S0924-4247(00)00495-7
- (2001) Sens. Actuators, A , vol.88 , pp. 79
- Hu, J.H.¹ Li, H.L.² Chan, H.L.W.³ Choy, C.L.⁴

26
- 84858038195
- 10.1109/TPEL.2011.2169431
- E. L. Horsley, A. V. Carazo, N. Nguyen-Quang, M. P. Foster, and D. A. Stone, IEEE Trans. Power Electron. 27, 2471 (2012). 10.1109/TPEL.2011.2169431
- (2012) IEEE Trans. Power Electron. , vol.27 , pp. 2471
- Horsley, E.L.¹ Carazo, A.V.² Nguyen-Quang, N.³ Foster, M.P.⁴ Stone, D.A.⁵

27
- 84861322565
- 10.6113/JPE.2012.12.3.387
- M. Amjad, Z. Salam, M. Facta, and K. Ishaque, J. Power Electron. 12, 387 (2012). 10.6113/JPE.2012.12.3.387
- (2012) J. Power Electron. , vol.12 , pp. 387
- Amjad, M.¹ Salam, Z.² Facta, M.³ Ishaque, K.⁴

28
- 68249156479
- 10.1109/TIA.2009.2023501
- J. M. Alonso, C. Ordiz, M. A. D. Costa, J. Ribas, and J. Cardesín, IEEE Trans. Indus. Appl. 45, 1513 (2009). 10.1109/TIA.2009.2023501
- (2009) IEEE Trans. Indus. Appl. , vol.45 , pp. 1513
- Alonso, J.M.¹ Ordiz, C.² Costa, M.A.D.³ Ribas, J.⁴ Cardesín, J.⁵

29
- 84899996393
- Power electronics and drive systems (PEDS)
- Singapore, 5-8 December
- S.-J. Huang and T.-S. Lee, " Power electronics and drive systems (PEDS)," in Proceedings of the 2011 IEEE Ninth International Conference, Singapore, 5-8 December 2011, p. 987.
- (2011) Proceedings of the 2011 IEEE Ninth International Conference , pp. 987
- Huang, S.-J.¹ Lee, T.-S.²

30
- 0036875890
- 10.1109/TPEL.2002.805602
- G. Ivensky, I. Zafrany, and S. Ben-Yaakov, IEEE Trans. Power Electron. 17, 1049 (2002). 10.1109/TPEL.2002.805602
- (2002) IEEE Trans. Power Electron. , vol.17 , pp. 1049
- Ivensky, G.¹ Zafrany, I.² Ben-Yaakov, S.³

31
- 33744990377
- Austin, TX, 6-10 March
- S. Choi, T. Kim, and B. H. Cho, in 20th Annual IEEE Proceedings on Applied Power Electronics Conference and Exposition (APEC), Austin, TX, 6-10 March 2005, p. 244.
- (2005) 20th Annual IEEE Proceedings on Applied Power Electronics Conference and Exposition (APEC) , pp. 244
- Choi, S.¹ Kim, T.² Cho, B.H.³

32
- 84866253261
- 10.1109/TPS.2012.2208125
- Q.-Y. Nie, A. Yang, Z.-Bin Wang, H.-P. Li, X.-Z. Zhang, and C.-Y. Bao, IEEE Trans. Plasma Sci. 40, 2172 (2012). 10.1109/TPS.2012.2208125
- (2012) IEEE Trans. Plasma Sci. , vol.40 , pp. 2172
- Nie, Q.-Y.¹ Yang, A.² Wang, Z.-B.³ Li, H.-P.⁴ Zhang, X.-Z.⁵ Bao, C.-Y.⁶

33
- 84861140703
- 10.1088/0963-0252/21/3/034004
- K. Urabe, B. L. Sands, B. N. Ganguly, and O. Sakai, Plasma Sources Sci. Technol. 21, 034004 (2012). 10.1088/0963-0252/21/3/034004
- (2012) Plasma Sources Sci. Technol. , vol.21 , pp. 034004
- Urabe, K.¹ Sands, B.L.² Ganguly, B.N.³ Sakai, O.⁴

34
- 84882414482
- 10.1109/TPS.2013.2268579
- X. Lu and S. Wu, IEEE Trans. Plasma Sci. 41, 2313 (2013). 10.1109/TPS.2013.2268579
- (2013) IEEE Trans. Plasma Sci. , vol.41 , pp. 2313
- Lu, X.¹ Wu, S.²

35
- 81255149120
- 10.1109/TPS.2011.2147802
- J. Y. Kim, H.-B. Gu, Y.-S. Ko, and S.-O. Kim, IEEE Trans. Plasma Sci. 39, 2302 (2011). 10.1109/TPS.2011.2147802
- (2011) IEEE Trans. Plasma Sci. , vol.39 , pp. 2302
- Kim, J.Y.¹ Gu, H.-B.² Ko, Y.-S.³ Kim, S.-O.⁴

36
- 84859925590
- 10.1109/TPS.2011.2169656
- M.-Y. Qian, C.-S. Ren, D.-Z. Wang, Q.-Q. Fan, Q.-Y. Nie, X.-Q. Wen, and J.-L. Hang, IEEE Trans. Plasma Sci. 40, 1134 (2012). 10.1109/TPS.2011.2169656
- (2012) IEEE Trans. Plasma Sci. , vol.40 , pp. 1134
- Qian, M.-Y.¹ Ren, C.-S.² Wang, D.-Z.³ Fan, Q.-Q.⁴ Nie, Q.-Y.⁵ Wen, X.-Q.⁶ Hang, J.-L.⁷

37
- 84889084785
- 10.1016/j.ceramint.2013.10.052
- S.-T. Lien, J.-Z. Chen, Y.-J. Yang, C.-C. Hsu, and I.-C. Cheng, Ceram. Int. 40, 2707 (2014). 10.1016/j.ceramint.2013.10.052
- (2014) Ceram. Int. , vol.40 , pp. 2707
- Lien, S.-T.¹ Chen, J.-Z.² Yang, Y.-J.³ Hsu, C.-C.⁴ Cheng, I.-C.⁵

38
- 18844424704
- 10.1109/TPS.2005.845377
- M. Teschke, J. Kedzierski, E. G. Finantu-Dinu, D. Korzec, and J. Engemann, IEEE Trans. Plasma Sci. 33, 310 (2005). 10.1109/TPS.2005.845377
- (2005) IEEE Trans. Plasma Sci. , vol.33 , pp. 310
- Teschke, M.¹ Kedzierski, J.² Finantu-Dinu, E.G.³ Korzec, D.⁴ Engemann, J.⁵

39
- 70349631623
- 10.1007/s00216-009-2753-5
- R. Heming, A. Michel, S. B. Olenici, S. Tombrink, and J. Franke, Anal. Bioanal. Chem. 395, 611 (2009). 10.1007/s00216-009-2753-5
- (2009) Anal. Bioanal. Chem. , vol.395 , pp. 611
- Heming, R.¹ Michel, A.² Olenici, S.B.³ Tombrink, S.⁴ Franke, J.⁵

40
- 84886850170
- 10.4028/www.scientific.net/AMR.791-793.1841
- Y. Hu, Z. Du, and Z. Chen, Adv. Mater. Res. 791-793, 1841 (2013). 10.4028/www.scientific.net/AMR.791-793.1841
- (2013) Adv. Mater. Res. , vol.791-793 , pp. 1841
- Hu, Y.¹ Du, Z.² Chen, Z.³

41
- 84883081968
- 10.1117/12.2029792
- M. Babij, T. Gotszalk, Z. W. Kowalski, K. Nitsch, J. Silberring, and M. Smoluch, Proc. SPIE 8902, 890208 (2013). 10.1117/12.2029792
- (2013) Proc. SPIE , vol.8902 , pp. 890208
- Babij, M.¹ Gotszalk, T.² Kowalski, Z.W.³ Nitsch, K.⁴ Silberring, J.⁵ Smoluch, M.⁶

42
- 33750588833
- 10.1088/0963-0252/15/4/S03
- E. Stoffels, I. E. Kieft, R. E. J. Sladek, L. J. M. van den Bedem, E. P. van der Laan, and M. Steinbuch, Plasma Sources Sci. Technol. 15, S169 (2006). 10.1088/0963-0252/15/4/S03
- (2006) Plasma Sources Sci. Technol. , vol.15
- Stoffels, E.¹ Kieft, I.E.² Sladek, R.E.J.³ Van Den Bedem, L.J.M.⁴ Van Der Laan, E.P.⁵ Steinbuch, M.⁶

43
- 33747850804
- 10.1109/TPS.2006.878431
- J. Goree, B. Liu, D. Drake, and E. Stoffels, IEEE Trans. Plasma Sci. 34, 1317 (2006). 10.1109/TPS.2006.878431
- (2006) IEEE Trans. Plasma Sci. , vol.34 , pp. 1317
- Goree, J.¹ Liu, B.² Drake, D.³ Stoffels, E.⁴

44
- 36348942317
- 10.1088/0022-3727/40/23/017
- D. Dudek, N. Bibinov, J. Engemann, and P. Awakowicz, J. Phys. D: Appl. Phys. 40, 7367 (2007). 10.1088/0022-3727/40/23/017
- (2007) J. Phys. D: Appl. Phys. , vol.40 , pp. 7367
- Dudek, D.¹ Bibinov, N.² Engemann, J.³ Awakowicz, P.⁴

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