SCOPUS 정보 검색 플랫폼

Volumn 305, Issue , 2014, Pages 753-759

Preparation and photocatalytic activity of Mg x Zn 1-x O thin films on silicon substrate through sol-gel process

(14) Liu, Changlong a,b Shang, Fengjiao b Pan, Guangcai b Wang, Feng b Zhou, Zhitao b Gong, Wanbing b,d Zi, Zhenfa b Wei, Yiyong b Chen, Xiaoshuang a Lv, Jianguo a,b,c He, Gang c Zhang, Miao c Song, Xueping c Sun, Zhaoqi c

a SHANGHAI INSTITUTE OF TECHNICAL PHYSICS (China)

b HEFEI NORMAL UNIVERSITY (China)

c ANHUI UNIVERSITY (China)

d INSTITUTE OF SOLID STATE PHYSICS (China)

Author keywords

Fourier transform infrared spectrum; Photocatalytic activity; Photoluminescence spectrum

Indexed keywords

AMORPHOUS FILMS; ANNEALING; FILM PREPARATION; GRAIN SIZE AND SHAPE; II-VI SEMICONDUCTORS; MAGNESIA; MAGNESIUM ALLOYS; OXIDE FILMS; PHOTOCATALYSIS; PHOTOLUMINESCENCE; PHOTOLUMINESCENCE SPECTROSCOPY; SEMICONDUCTOR ALLOYS; SILICON; SILICON COMPOUNDS; SOL-GEL PROCESS; STRETCHING; SUBSTRATES; ZINC ALLOYS; ZINC OXIDE; ZINC SULFIDE;

ASYMMETRIC STRETCHING; FOURIER TRANSFORM INFRARED SPECTRA; HEXAGONAL WURTZITE STRUCTURE; MGXZN1-XO THIN FILMS; PHOTOCATALYTIC ACTIVITIES; PHOTOLUMINESCENCE SPECTRUM; SURFACE FLUCTUATIONS; ULTRAVIOLET EMISSION;

THIN FILMS;

EID: 84899959839 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2014.03.192 Document Type: Article

Times cited : (12)

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