Hydrogen lithography for nanomagnetic domain on Co-doped ZnO using an anodic aluminum oxide template

Applied Physics Letters

Volumn 104, Issue 5, 2014, Pages

  Lee, Seunghun ^a,f   Kim, Won Kyung ^a   Cho, Yong Chan ^a   Kim, Bum Su ^a   Park, Ji Hun ^a   Lee, Chang Won ^b   Lee, Youngpak ^c   Lee, Sangbok ^d   Fackler, Sean ^e   Takeuchi, Ichiro ^e   Cho, Chae Ryong ^a   Jeong, Se Young ^a  

^a Pusan National University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^c Hanyang University   (South Korea)

^d University of Maryland   (United States)

^e UNIVERSITY OF MARYLAND   (United States)

^f Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANODIC OXIDATION; COBALT COMPOUNDS; HYDROGEN; II-VI SEMICONDUCTORS; LITHOGRAPHY; MAGNETIC DOMAINS; NANOMAGNETICS; OXIDE MINERALS; PARAMAGNETISM; ZINC OXIDE;

ANODIC ALUMINUM OXIDE TEMPLATE; CO-DOPED ZNO; HYDROGEN EXPOSURE; HYDROGEN LITHOGRAPHY; IN-PLANE MAGNETIZATION; OBJECT ORIENTED; PARAMAGNETIC HOST; TAIL CONFIGURATION;

ALUMINUM OXIDE;

EID: 84899791776     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4864150     Document Type: Article

References (34)

1. S. A. Wolf, D. D. Awschalom, R. A. Buhrman, J. M. Daughton, S. von Molnár, M. L. Roukes, A. Y. Chtchelkanova, and D. M. Treger, Science 294, 1488 (2001). 10.1126/science.1065389
2. D. D. Awschalom and M. E. Flatté, Nat. Phys. 3, 153 (2007). 10.1038/nphys551
3. D. A. Allwood, G. Xiong, C. C. Faulkner, D. Atkinson, D. Petit, and R. P. Cowburn, Science 309, 1688 (2005). 10.1126/science.1108813
4. D. B. Carlton, N. C. Emley, E. Tuchfeld, and J. Bokor, Nano Lett. 8, 4173 (2008). 10.1021/nl801607p
5. A. Imre, G. Csaba, L. Ji, A. Orlov, G. H. Bernstein, and W. Porod, Science 311, 205 (2006). 10.1126/science.1120506
6. H. Ohno, D. Chiba, F. Matsukura, T. Omiya, E. Abe, T. Dietl, Y. Ohno, and K. Ohtani, Nature 408, 944 (2000). 10.1038/35050040
7. M. Yamanouchi, D. Chiba, F. Matsukura, and H. Ohno, Nature 428, 539 (2004). 10.1038/nature02441
8. T. Dietl, Nat. Mater. 9, 965 (2010). 10.1038/nmat2898
9. S. A. Chambers, T. C. Droubay, C. M. Wang, K. M. Rosso, S. M. Heald, D. A. Schwartz, K. R. Kittilstved, and D. R. Gamelin, Mater. Today 9, 28 (2006). 10.1016/S1369-7021(06)71692-3
10. Y. Yamada, K. Ueno, T. Fukumura, H. T. Yuan, H. Shimotani, Y. Iwasa, L. Gu, S. Tsukimoto, Y. Ikuhara, and M. Kawasaki, Science 332, 1065 (2011). 10.1126/science.1202152
11. W. Liang, B. D. Yuhas, and P. Yang, Nano Lett. 9, 892 (2009). 10.1021/nl8038184
12. K. M. Whitaker, M. Raskin, G. Kiliani, K. Beha, S. T. Ochsenbein, N. Janssen, M. Fonin, U. Rüdiger, A. Leitenstorfer, D. R. Gamelin, and R. Bratschitsch, Nano Lett. 11, 3355 (2011). 10.1021/nl201736p
13. N. Tahir, A. Karim, K. A. Persson, S. T. Hussain, G. A. Cruz, M. Usman, M. Naeem, R. Qiao, W. Yang, Y.-D. Chuang, and Z. Hussain, J. Phys. Chem. C 117, 8968 (2013). 10.1021/jp311012m
14. L. Li, Y. Guo, X. Y. Cui, R. Zheng, K. Ohtani, C. Kong, A. V. Ceguerra, M. P. Moody, J. D. Ye, and H. H. Tan, Phys. Rev. B 85, 174430 (2012). 10.1103/PhysRevB.85.174430
15. G. Ciatto, A. Di Trolio, E. Fonda, P. Alippi, A. M. Testa, and A. A. Bonapasta, Phys. Rev. Lett. 107, 127206 (2011). 10.1103/PhysRevLett.107.127206
16. A. N. Andriotis and M. Menon, Phys. Rev. B 87, 155309 (2013). 10.1103/PhysRevB.87.155309
17. H. B. de Carvalho, M. P. F. de Godoy, R. W. D. Paes, M. Mir, A. Ortiz de Zevallos, F. Iikawa, M. J. S. P. Brasil, V. A. Chitta, W. B. Ferraz, M. A. Boselli, and A. C. S. Sabioni, J. Appl. Phys. 108, 033914 (2010). 10.1063/1.3459885
18. S. B. Ogale, Adv. Mater. 22, 3125 (2010). 10.1002/adma.200903891
19. C. H. Park and D. J. Chadi, Phys. Rev. Lett. 94, 127204 (2005). 10.1103/PhysRevLett.94.127204
20. H.-J. Lee, C. H. Park, S.-Y. Jeong, K.-J. Yee, C. R. Cho, M.-H. Jung, and D. J. Chadi, Appl. Phys. Lett. 88, 062504 (2006). 10.1063/1.2171789
21. S. Lee, Y. C. Cho, S.-J. Kim, C. R. Cho, S.-Y. Jeong, S. J. Kim, J. P. Kim, Y. N. Choi, and J. M. Sur, Appl. Phys. Lett. 94, 212507 (2009). 10.1063/1.3136845
22. Y. C. Cho, S. Lee, H. H. Nahm, S. J. Kim, C. H. Park, S. Y. Lee, S.-K. Kim, C. R. Cho, H. Koinuma, and S.-Y. Jeong, Appl. Phys. Lett. 100, 112403 (2012) 10.1063/1.3694040.
23. S. Lee, B.-S. Kim, S.-W. Seo, Y. C. Cho, S. K. Kim, J. P. Kim, I.-K. Jeong, C. R. Cho, C. U. Jung, H. Koinuma, and S.-Y. Jeong, J. Appl. Phys. 111, 07C304 (2012) 10.1063/1.3671786.
24. Y. C. Cho, S.-J. Kim, S. Lee, S. J. Kim, C. R. Cho, H.-H. Nahm, C. H. Park, I. K. Jeong, S. Park, T. E. Hong, S. Kuroda, and S.-Y. Jeong, Appl. Phys. Lett. 95, 172514 (2009). 10.1063/1.3257733
25. S. J. Kim, S. Lee, Y. C. Cho, Y. N. Choi, S. Park, I. K. Jeong, Y. Kuroiwa, C. Moriyoshi, and S.-Y. Jeong, Phys. Rev. B 81, 212408 (2010). 10.1103/PhysRevB.81.212408
26. J. M. Shin, H. S. Lee, S. Y. Cha, S. Lee, J. Y. Kim, N. Park, Y. C. Cho, S. J. Kim, S.-K. Kim, J.-S. Bae, S. Park, R. C. Cho, H. Koinuma, and S.-Y. Jeong, Appl. Phys. Lett. 100, 172409 (2012). 10.1063/1.4705304
27. S. J. Kim, S. Y. Cha, J. Y. Kim, J. M. Shin, Y. C. Cho, S. Lee, W.-K. Kim, S.-Y. Jeong, Y. S. Yang, C. R. Cho, H. W. Choi, M.-H. Jung, B.-E. Jun, K.-Y. Kwon, Y. Kuroiwa, and C. Moriyoshi, J. Phys. Chem. C 116, 12196 (2012). 10.1021/jp300536w
28. G. A. Prinz, Science 282, 1660 (1998). 10.1126/science.282.5394.1660
29. Y. Ohno, D. K. Young, B. Beschoten, F. Matsukura, H. Ohno, and D. D. Awschalom, Nature 402, 790 (1999) 10.1038/45509.
30. M. Cavallini, J. Gomez-Segura, D. Ruiz-Molina, M. Massi, C. Albonetti, C. Rovira, J. Veciana, and F. Biscarini, Angew. Chem. 117, 910 (2005). 10.1002/ange.200461554
31. M. Ivill, S. Pearton, S. Rawal, L. Leu, P. Sadik, R. Das, A. Hebard, M. Chisholm, J. D. Budai, and D. P. Norton, New J. Phys. 10, 065002 (2008). 10.1088/1367-2630/10/6/065002
32. G. Chen, C. Song, C. Chen, S. Gao, F. Zeng, and F. Pan, Adv. Mater. 24, 3515 (2012). 10.1002/adma.201201595
33. See supplementary material at http://dx.doi.org/10.1063/1.4864150 E-APPLAB-104-132405 for details on the experimental procedure of the selective hydrogen exposure with conventional UV lithography technique (Fig. S1), the AFM and MFM results for ZnCoO thin film after selective exposure to hydrogen using a periodic PR pattern (Fig. S2), and the experimental procedure of the hydrogen lithography with an AAO template (Fig. S3).
34. A. Werpachowska and T. Dietl, Phys. Rev. B 82, 085204 (2010). 10.1103/PhysRevB.82.085204