All-water-based electron-beam lithography using silk as a resist

Nature Nanotechnology

Volumn 9, Issue 4, 2014, Pages 306-310

  Kim, Sunghwan ^a,c   Marelli, Benedetto ^a   Brenckle, Mark A ^a   Mitropoulos, Alexander N ^a   Gil, Eun Seok ^a   Tsioris, Konstantinos ^a,d   Tao, Hu ^a   Kaplan, David L ^a   Omenetto, Fiorenzo G ^a,b  

^a Tufts University   (United States)

^b TUFTS UNIVERSITY   (United States)

^c Ajou University   (South Korea)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRONS; NANOCRYSTALS; NANOIMPRINT LITHOGRAPHY; OPTICAL LATTICES; ORGANIC CHEMICALS; PHOTONICS; POLYETHYLENE GLYCOLS; PROTEINS; SEMICONDUCTOR QUANTUM DOTS;

ALTERNATIVE PROCEDURES; CRYSTALLINE STRUCTURE; GREEN FLUORESCENT PROTEIN; HORSERADISH PEROXIDASE; LINE EDGE ROUGHNESS; NANOFABRICATION TECHNIQUES; NANOSCALE PHOTONICS; PROOF OF PRINCIPLES;

SILK;

DNA; GREEN FLUORESCENT PROTEIN; HORSERADISH PEROXIDASE; MACROGOL; NANOMATERIAL; POLYMER; QUANTUM DOT; SILK FIBROIN; SOLVENT; WATER; SILK;

AQUEOUS SOLUTION; ARTICLE; BIOLOGICAL ACTIVITY; CRYSTAL STRUCTURE; ELECTRON BEAM; ELECTRON BEAM LITHOGRAPHY; HYDROPHILICITY; INFRARED SPECTROSCOPY; NANOFABRICATION; PARTICLE SIZE; PRIORITY JOURNAL; SOLUBILITY; MOLECULAR INTERACTION; SCANNING ELECTRON MICROSCOPY; WATER TRANSPORT;

GREEN FLUORESCENT PROTEINS; HORSERADISH PEROXIDASE; MEMBRANES, ARTIFICIAL; QUANTUM DOTS; SILK; WATER;

EID: 84898919492     PISSN: 17483387     EISSN: 17483395     Source Type: Journal    
DOI: 10.1038/nnano.2014.47     Document Type: Article

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