Mechanism for limiting thickness of thin oxide films on aluminum

Physical Review Letters

Volumn 112, Issue 14, 2014, Pages

  Baran, Jakub D ^a   Grönbeck, Henrik ^a   Hellman, Anders ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM; CALCULATIONS; CONTINUUM MECHANICS; FILM GROWTH; FILM THICKNESS; GAS ADSORPTION; INTERFACES (MATERIALS); METAL IONS; METALLIC COMPOUNDS; OXYGEN;

ADSORBED MOLECULES; CONTINUUM MODELING; METALLIC ALUMINUM; OXIDE-METAL INTERFACE; OXIDIZING CONDITIONS; OXYGEN ADSORPTION; THICKNESS OF OXIDE FILM; THIN ALUMINA FILM;

OXIDE FILMS;

EID: 84898440235     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.112.146103     Document Type: Article

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