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Volumn 27, Issue , 2012, Pages 426-431

Al2O3/SiNx-stacks at increased temperatures: Avoiding blistering during contact firing

Author keywords

Blistering Stability; Deposition Temperature; Firing; Passivation

Indexed keywords


EID: 84897149355     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2012.07.088     Document Type: Conference Paper
Times cited : (22)

References (9)
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  • 3
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    • Lüder, T.1    Hahn, G.2    Terheiden, B.3
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  • 5
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    • Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry
    • Ott AW, McCarley KC, Klaus JW, Way JD, George SM. Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry. Appl Surf Sci 1996;107:128-36.
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    • Ott, A.W.1    McCarley, K.C.2    Klaus, J.W.3    Way, J.D.4    George, S.M.5
  • 7
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    • Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
    • Dingemans G, Beyer W, van de Sanden MCM, Kessels WMM. Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks. Appl Phys Lett 2010;97:152106.
    • (2010) Appl Phys Lett , vol.97 , pp. 152106
    • Dingemans, G.1    Beyer, W.2    Van De Sanden, M.C.M.3    Kessels, W.M.M.4
  • 8
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    • Comparison of the thermal stability of single Al2O3 layers and Al2O3/SiNx stacks for the surface passiviation of silicon
    • Veith B, Werner F, Zielke D, Brendel R, Schmidt J. Comparison of the thermal stability of single Al2O3 layers and Al2O3/SiNx stacks for the surface passiviation of silicon. Energy Procedia 2011;8:307-12.
    • (2011) Energy Procedia , vol.8 , pp. 30-712
    • Veith, B.1    Werner, F.2    Zielke, D.3    Brendel, R.4    Schmidt, J.5
  • 9
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    • Annealing behavior of Al2O3 thin films grown on crystalline silicon by atomic layer deposition
    • Lüder T, Raabe B, Terheiden B. Annealing Behavior of Al2O3 Thin Films Grown on Crystalline Silicon by Atomic Layer Deposition. Proc 25th EU PVSEC 2010, p. 2138-40
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.