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Volumn 190, Issue , 2014, Pages 267-274
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Fabrication of nanoporous silicon oxycarbide materials using layered double-hydroxide as a sacrificial template
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Author keywords
Chemical vapor deposition; Hierarchical pore structure; Layered double hydroxide; Silicon oxycarbide
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Indexed keywords
HIERARCHICAL PORE STRUCTURES;
HIERARCHICAL STRUCTURES;
LAYERED DOUBLE HYDROXIDES;
LAYERED STRUCTURES;
NANO-POROUS SILICON;
SACRIFICIAL TEMPLATES;
SILICON OXYCARBIDES;
SYNTHESIS PROCEDURE;
CHEMICAL VAPOR DEPOSITION;
FABRICATION;
PHOTOELECTRONS;
POLYACRYLONITRILES;
POROUS SILICON;
SCANNING ELECTRON MICROSCOPY;
VAPORS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
MATERIALS;
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EID: 84896781110
PISSN: 13871811
EISSN: None
Source Type: Journal
DOI: 10.1016/j.micromeso.2014.02.001 Document Type: Article |
Times cited : (11)
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References (39)
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