Interface and interlayer barrier effects on photo-induced electron emission from low work function diamond films

Diamond and Related Materials

Volumn 44, Issue , 2014, Pages 123-128

  Sun, Tianyin ^a   Koeck, Franz A M ^a   Stepanov, Petr B ^a,b,c   Nemanich, Robert J ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

^b TECHNOLOGICAL INSTITUTE FOR SUPERHARD AND NOVEL CARBON MATERIALS   (Russian Federation)

^c MOSCOW INSTITUTE OF PHYSICS AND TECHNOLOGY   (Russian Federation)

Author keywords

Doped diamond; PEEM; Photo induced emission; Thermionic emission

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; DOPING (ADDITIVES); ELECTRON EMISSION; INTERFACES (MATERIALS); SUBSTRATES; THERMIONIC EMISSION;

CHEMICAL VAPOR DEPOSITIONS (CVD); DOPED DIAMONDS; ELECTRON EMISSION SPECTRA; HYDROGEN-TERMINATED DIAMOND; NEGATIVE ELECTRON AFFINITY; PEEM; PHOTO-INDUCED; ULTRA-NANOCRYSTALLINE DIAMOND;

DIAMOND FILMS;

EID: 84896451131     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2014.02.008     Document Type: Article

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