Oxygen plasma resurrection of triode type carbon nanotube field emission cathodes

Diamond and Related Materials

Volumn 43, Issue , 2014, Pages 1-4

  Sanborn, Graham ^b   Turano, Stephan ^a   Ready, W Jud ^a,b  

^a GEORGIA TECH RESEARCH INSTITUTE   (United States)

^b Georgia Institute of Technology   (United States)

Author keywords

Chemical vapor deposition; Etching; Field emission; Nanotubes; Oxidation; Reactive ion etching (RIE)

Indexed keywords

DISPLAY TECHNOLOGIES; FIELD ELECTRON EMISSIONS; MANUFACTURABILITY; OPEN CIRCUITS; OXYGEN PLASMAS; PLASMA TREATMENT;

CHEMICAL VAPOR DEPOSITION; ELECTRON SOURCES; ETCHING; FIELD EMISSION; FIELD EMISSION CATHODES; NANOTUBES; OXIDATION; OXYGEN; PLASMAS; REACTIVE ION ETCHING;

CARBON NANOTUBES;

EID: 84893197558     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2014.01.006     Document Type: Article

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