Methods of simulating thin film deposition using spray pyrolysis techniques

Microelectronic Engineering

Volumn 117, Issue , 2014, Pages 57-66

  Filipovic, Lado ^a   Selberherr, Siegfried ^a   Mutinati, Giorgio C ^b   Brunet, Elise ^b   Steinhauer, Stephan ^b   Köck, Anton ^b   Teva, Jordi ^c   Kraft, Jochen ^c   Siegert, Jörg ^c   Schrank, Franz ^c  

^a INSTITUTE FOR MICROELECTRONICS   (Austria)

^b AIT GmbH   (Austria)

^c AMS AG   (Austria)

Author keywords

Level Set; Smart gas sensors; Spray pyrolysis deposition; Tin oxide film; Topography simulation

Indexed keywords

DEPOSITION TECHNIQUE; LAYER BY LAYER DEPOSITION; LEVEL SET; PRESSURE ATOMIZING NOZZLES; SPRAY PYROLYSIS DEPOSITION; SPRAY-PYROLYSIS TECHNIQUES; THIN-FILM DEPOSITIONS; TOPOGRAPHY SIMULATION;

CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; DROPS; FILM GROWTH; GAS DETECTORS; INTERFACES (MATERIALS); OXIDE FILMS; SPRAY PYROLYSIS; TIN; TIN OXIDES; VAPORS;

DEPOSITION;

EID: 84892607929     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2013.12.025     Document Type: Article

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