Continuous and scale-up synthesis of high purity H2O2 by safe gas-phase H2/O2 plasma reaction

AIChE Journal

Volumn 60, Issue 2, 2014, Pages 415-419

  Yi, Yanhui ^a   Zhou, Juncheng ^a,b   Gao, Tianlong ^a   Guo, Hongchen ^a   Zhang, Jialiang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b Purification Equipment Research Institute   (China)

Author keywords

Continuous synthesis; High purity H2O2; Plasma; Scale up; Semiconductors

Indexed keywords

CONTINUOUS SYNTHESIS; DIELECTRIC BARRIER DISCHARGES; HIGH PURITY; HIGH VOLTAGE ELECTRODES; HOMOGENEOUS DISCHARGES; INTEGRATED DEVICE; SCALE-UP; SEMICONDUCTOR INDUSTRY;

INSULATED WIRE; LITHOGRAPHY; PLASMAS; POWDER METALS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR MATERIALS; SYNTHESIS (CHEMICAL);

ELECTRIC DISCHARGES;

EID: 84892408074     PISSN: 00011541     EISSN: 15475905     Source Type: Journal    
DOI: 10.1002/aic.14327     Document Type: Article

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