New implantation tables for B, BF2, P, As, in and Sb

Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 567-570

  Zechner, Christoph ^a   Erlebach, Axel ^a   Terterian, Arsen ^b   Scholze, Andreas ^b   Johnson, Mark ^b  

^a SYNOPSYS SWITZERLAND LLC   (Switzerland)

^b Development ISE Inc   (United States)

Author keywords

ion implantation; process simulation; TCAD

Indexed keywords

INTELLIGENT SYSTEMS; ION IMPLANTATION; IONS; SILICON OXIDES;

ANALYTICAL FUNCTIONS; CALIBRATED MONTE CARLO; CRYSTALLINE SILICONS; DISTRIBUTION OF IONS; IMPLANTATION CONDITIONS; MONTE CARLO DATA; PROCESS SIMULATIONS; TCAD;

MONTE CARLO METHODS;

EID: 84892333559     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IIT.2002.1258068     Document Type: Conference Paper

References (10)

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