Compact and comprehensive database for ion-implanted As profile

IEEE Transactions on Electron Devices

Volumn 47, Issue 1, 2000, Pages 44-49

  Suzuki, Kunihiro ^a   Sudo, Ritsuo ^a   Feudel, Thomas ^a   Fichtner, Wolfgang ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; COMPUTER SIMULATION; CRYSTAL IMPURITIES; CRYSTALLINE MATERIALS; DATABASE SYSTEMS; MONTE CARLO METHODS; PROBABILITY; SECONDARY ION MASS SPECTROMETRY; SILICA; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

COVER OXIDE THICKNESS DEPENDENCE; ION IMPLANTATION PROFILES; MONTE CARLO SIMULATOR CRYSTAL-TRIM; TILT ANGLE;

ION IMPLANTATION;

EID: 0033875454     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.817565     Document Type: Article

References (15)