Investigation of molecular diffusivity of photoresist membrane using coarse-grained molecular dynamics simulation

Procedia Engineering

Volumn 47, Issue , 2012, Pages 402-405

  Yagyu, Hiromasa ^a   Hirai, Yoshikazu ^b   Makino, Yoshihide ^b   Sugano, Koji ^b   Toshiyuki, Tsuchiya ^b   Tabata, Osamu ^b  

^a Limited   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

Membrane; Molecular dynamics simulation; Molecules permeability; Photoresist

Indexed keywords

EID: 84891684725     PISSN: 18777058     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.proeng.2012.09.168     Document Type: Conference Paper

References (5)

1. Campo A D, Greiner C. SU-8: A photoresist for high-aspect-ratio and 3D submicron lithography. J. Micromech. Microeng. 2007;17:p.R81-R95.
2. Hirai Y, Sugano K, Tsuchiya T, Tabata O. Embedded Microstructure Fabrication using Developer-Permeability of Semi- Cross-Linked Negative Resist. J. Microelectromech. Syst. 2010;19:pp.1058-69.
3. Hirai Y, Uesugi A, Makino Y, Yagyu Y, Sugano K, Tsuchiya T, Tabata O. Negative-Photoresist Mechanical Property for Nano-Filtration Membrane Embedded in Microfluidics. Proceedings of Transducers 2011:2706-9.
4. Yagyu Y, Hirai Y, Uesugi A, Makino Y, Sugano K, Tsuchiya T, Tabata O. Coarse-Grained Molecular Dynamics Simulation of Epoxy-Based Chemically-Amplified Resist for MEMS Application. MRS Proceedings 2012; 5-14.
5. Crank J, Park G S. Diffusion Polymers New York: Academic Press, 1968, Chapter 3.