Adsorptive removal of sulfur compounds using IRMOF-3 at ambient temperature

Applied Surface Science

Volumn 289, Issue , 2014, Pages 107-113

  Wang, Xiao Ling ^a   Fan, Hui Ling ^a   Tian, Zhen ^b   He, En Yun ^a   Li, Ye ^a   Shangguan, Ju ^a  

^a TAIYUAN UNIVERSITY OF TECHNOLOGY   (China)

^b SHANGHAI SECOND POLYTECHNIC UNIVERSITY   (China)

Author keywords

Dimethyl sulfide; Ethyl mercaptan; Hydrogen sulfide; IRMOF 3; Sulfur removal

Indexed keywords

ATOMS; CHEMICAL REACTORS; CRYSTALLINE MATERIALS; DESULFURIZATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDRODESULFURIZATION; HYDROGEN BONDS; HYDROGEN SULFIDE; II-VI SEMICONDUCTORS; ORGANOMETALLICS; SULFUR DETERMINATION; TEMPERATURE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC SULFIDE;

ACID BASE INTERACTION; DIMETHYL SULFIDE; ETHYL MERCAPTANS; FOURIER TRANSFORM INFRARED; HYDROGEN BOND COMPLEXES; INTERACTION STRENGTH; IRMOF-3; METAL ORGANIC FRAMEWORK;

SULFUR COMPOUNDS;

EID: 84890563503     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.10.115     Document Type: Article

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