Analysis of strain in dielectric coated three dimensional Si micropillar arrays

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 31, Issue 6, 2013, Pages

  Voss, Lars F ^a   Reinhardt, Cathy E ^a   Graff, Robert T ^a   Conway, Adam M ^a   Shao, Qinghui ^a   Nikolic, Rebecca J ^a   Dar, Mushtaq A ^b   Cheung, Chin L ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITED; COMPRESSIVE STRAIN; CROSS-SECTIONAL SHAPE; LOW PRESSURES; MICRO RAMAN SPECTROSCOPY; MICROPILLAR ARRAYS; STRAIN CONCENTRATION; STRESS-INDUCED;

STRAIN; VAPORS;

SILICON;

EID: 84888422825     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4826500     Document Type: Article

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