Aluminum plasmonics: Optimization of plasmonic properties using liquid-prism-coupled ellipsometry

Optics Express

Volumn 21, Issue 23, 2013, Pages 28638-28650

  Diest, Kenneth ^a   Liberman, Vladimir ^a   Lennon, Donna M ^a   Welander, Paul B ^a,b   Rothschild, Mordechai ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; ELECTROMAGNETIC WAVE POLARIZATION; LIQUIDS; METALLIC FILMS; OPTICAL CONDUCTIVITY; OPTIMIZATION; PLASMONS; PRISMS; SEMICONDUCTOR QUANTUM WELLS; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ROUGHNESS;

ALUMINUM THIN FILMS; FIGURES OF MERITS; INTER-BAND TRANSITION; INTERBAND TRANSITION ENERGIES; LOW SURFACE ROUGHNESS; PLASMONIC PROPERTIES; SURFACE PLASMON POLARITONS; ULTRAVIOLET WAVELENGTH;

ALUMINUM;

EID: 84888247150     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.028638     Document Type: Article

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