Microscopy-based description of CMP pad microtexture and asperity-scale modeling of slurry flow dynamics

2006 Proceedings - 11th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference, CMP-MIC 2006

Volumn , Issue , 2006, Pages 262-271

  Muldowney, Gregory P ^a   Elmufdi, Carolina L ^a   Palaparthi, Ravi ^a   Tselepidakis, Dimitri P ^b   Natu, Sandeepak G ^b   Vikas, Varun ^b  

^a ROHM AND HAAS COMPANY   (United States)

^b ANSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GRIDS; CONFOCAL REFLECTANCE MICROSCOPIES; HARD POLYURETHANES; MICROSCOPY IMAGES; MOMENTUM EQUATION; RELATIVE VELOCITY; SLURRY VELOCITIES; TRANSPORT CALCULATION;

LAMINAR FLOW; TEXTURES;

CHEMICAL MECHANICAL POLISHING;

EID: 84888224040     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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