Arsenic formation on GaAs during etching in HF solutions: Relevance for the epitaxial lift-off process

ECS Journal of Solid State Science and Technology

Volumn 2, Issue 3, 2013, Pages

  Smeenk, N J ^a   Engel, J ^a   Mulder, P ^a   Bauhuis, G J ^a   Bissels, G M M W ^a   Schermer, J J ^a   Vlieg, E ^a   Kelly, J J ^b  

^a RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84887433446     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.006303jss     Document Type: Article

References (31)

1. D. J. Friedman, Current Opinion in Solid State & Materials Science, 14, 131 (2010).
2. M. A. Green, K. Emery, Y. Hishikawa, W. Warta, and E. D. Dunlop, Progress in Photovoltaics, 19, 565 (2011).
3. J. J. Schermer, G. J. Bauhuis, P. Mulder, W. J. Meulemeesters, E. Haverkamp, M. M. A. J. Voncken, and P. K. Larsen, Applied Physics Letters, 76, 2131 (2000).
4. G. J. Bauhuis, P. Mulder, E. J. Haverkamp, J. J. Schermer, L. J. Nash,D. J. F. Fulgoni, I. M. Ballard, and G. Duggan, in Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE, p. 001243 (2010).
5. J. J. Schermer, P. Mulder, G. J. Bauhuis, M. Voncken, J. van Deelen, E. Haverkamp, and P. K. Larsen, Physica Status Solidi a-Applications and Materials Science, 202, 501 (2005).
6. G. J. Bauhuis, P. Mulder, E. J. Haverkamp, J. J. Schermer, E. Bongers, G. Oomen, W. Kostler, and G. Strobl, Progress in Photovoltaics, 18, 155 (2010).
7. G. J. Bauhuis, P. Mulder, E. J. Haverkamp, J. Huijben, and J. J. Schermer, Solar Energy Materials and Solar Cells, 93, 1488 (2009).
8. J. J. Schermer, P. Mulder, G. J. Bauhuis, P. K. Larsen, G. Oomen, and E. Bongers, Progress in Photovoltaics, 13, 587 (2005).
9. M. A. Green, K. Emery, Y. Hishikawa, W. Warta, and E. D. Dunlop, Progress in Photovoltaics, 20, 12 (2012).
10. R. Tatavarti, G. Hillier, G. Martin, A. Wibowo, R. Navaratnarajah, F. Tuminello, D. Hertkorn, M. Disabb, C. Youtsey, D. McCallum, and N. Pan, in Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE, p. 002065 (2009).
11. G. J. Bauhuis, P. Mulder, E. J. Haverkamp, J. J. Schermer, L. J. Nash,D. J. F. Fulgoni, I. M. Ballard, and G. Duggan, AIP Conference Proceedings, 1277, 16 (2010).
12. B. Furman, E. Menard, A. Gray, M. Meitl, S. Bonafede, D. Kneeburg, K. Ghosal, R. Bukovnik, W. Wagner, J. Gabriel, S. Seel, and S. Burroughs, in Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE, p. 000475 (2010).
13. J. Yoon, S. Jo, I. S. Chun, I. Jung, H. S. Kim, M. Meitl, E. Menard, X. L. Li, J. J. Coleman, U. Paik, and J. A. Rogers, Nature, 465, 329 (2010).
14. B. M. Kayes, H. Nie, R. Twist, S. G. Spruytte, F. Reinhardt, I. C. Kizilyalli, and G. S. Higashi, in Photovoltaic Specialists Conference (PVSC), 37th IEEE (2011).
15. A. T. J. van Niftrik, J. J. Schermer, G. J. Bauhuis, P. Mulder, P. K. Larsen, and J. J. Kelly, Journal of the Electrochemical Society, 154, D629 (2007).
16. M. Voncken, J. J. Schermer, A. T. J. van Niftrik, G. J. Bauhuis, P. Mulder, P. K. Larsen, T. P. J. Peters, B. de Bruin, A. Klaassen, and J. J. Kelly, Journal of the Electrochemical Society, 151, G347 (2004).
17. X. S. Wu, L. A. Coldren, and J. L. Merz, Electronics Letters, 21, 558 (1985).
18. M. M. A. J. Voncken, J. J. Schermer, G. J. Bauhuis, P. Mulder, and P. K. Larsen, Applied Physics a-Materials Science & Processing, 79, 1801 (2004).
19. J. Engel, Substrate degradation upon Epitaxial Lift-Off: an HF etch process study, in, Radboud University Nijmegen, Nijmegen (2011).
20. P. Swift, Surf. Interface Anal., 4, 47 (1982).
21. W. Storm, D. Wolany, F. Schroder, G. Becker, B. Burkhardt, and L. Wiedmann, J. Vac. Sci. Technol. B, 12, 147 (1994).
22. P. H. L. Notten, J. J. Kelly, and J. E. A. M. van den Meerakker, Etching of III-V semiconductors: an electrochemical approach, Elsevier Advanced Technology, Cambridge, UK (1990).
23. P. H. L. Notten, Journal of the Electrochemical Society, 131, 2641 (1984).
24. R. M. Costescu, C. Deneke, D. J. Thurmer, and O. G. Schmidt, Nanoscale Research Letters, 4, 1463 (2009).
25. J. J. Kelly and D. Vanmaekelbergh, in Semiconductor Micromachining: Fundamental electrochemistry and physics, S. A. Campbell and H. J. Lewerenz Editors, Wiley, Chichester (1997).
26. R. Memming and G. Schwandt, Electrochim. Acta, 13, 1299 (1968).
27. E. K. Propst, K. W. Vogt, and P. A. Kohl, Journal of the Electrochemical Society, 140, 3631 (1993).
28. J. J. Kelly, B. P.Minks, N. A. M. Verhaegh, J. Stumper, and L. M. Peter, Electrochim. Acta, 37, 909 (1992).
29. G. E. Ewing, Journal of Physical Chemistry B, 108, 15953 (2004).
30. Q. Dai, J. Hu, and M. Salmeron, Journal of Physical Chemistry B, 101, 1994 (1997).
31. M. C. R. Heijna, M. J. Theelen, W. J. P. van Enckevort, and E. Vlieg, Journal of Physical Chemistry B, 111, 1567 (2007).