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Journal of Physics D: Applied Physics

Volumn 46, Issue 45, 2013, Pages

Electrical characteristics of micro-hollow cathode discharges

(2) Lazzaroni, C a Chabert, P b

a UNIVERSITÉ PARIS 13 (France)

b ECOLE POLYTECHNIQUE (France)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE RESISTANCE; ELECTRIC FIELD PROFILES; ELECTRIC-FIELD MODEL; ELECTRICAL CHARACTERISTIC; MICRO-HOLLOW CATHODE DISCHARGES; SECONDARY EMISSION COEFFICIENTS; SELF CONSISTENT MODELING; VOLTAGE-CURRENT CHARACTERISTICS;

ELECTRIC FIELDS; SECONDARY EMISSION;

CATHODES;

EID: 84887042527 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/46/45/455203 Document Type: Article

Times cited : (10)

References (19)

1
- 0347622680
- 10.1088/0022-3727/36/23/020 0022-3727 020
- Arslanbekov R R and Kolobov V I 2003 J. Phys. D: Appl. Phys. 36 2986
- (2003) J. Phys. D: Appl. Phys. , vol.36 , Issue.23 , pp. 2986
- Arslanbekov, R.R.¹ Kolobov, V.I.²

2
- 33947620097
- 10.1088/0963-0252/16/1/004 0963-0252 004
- Aubert X, Bauville G, Guillon J, Lacour B, Puech V and Rousseau A 2007 Plasma Sources Sci. Technol. 16 23-32
- (2007) Plasma Sources Sci. Technol. , vol.16 , Issue.1 , pp. 23-32
- Aubert, X.¹ Bauville, G.² Guillon, J.³ Lacour, B.⁴ Puech, V.⁵ Rousseau, A.⁶

3
- 17044367058
- 10.1063/1.1862781 071501
- Boeuf J P, Pitchford L C and Schoenbach K H 2005 Appl. Phys. Lett. 86 071501
- (2005) Appl. Phys. Lett. , vol.86
- Boeuf, J.P.¹ Pitchford, L.C.² Schoenbach, K.H.³

4
- 78751524132
- 10.1063/1.3518533 113307
- Chabert P, Lazzaroni C and Rousseau A 2010 J. Appl. Phys. 108 113307
- (2010) J. Appl. Phys. , vol.108
- Chabert, P.¹ Lazzaroni, C.² Rousseau, A.³

5
- 0004263794
- Cobine J D 1958 Gaseous Conductors (New York: Dover)
- (1958) Gaseous Conductors
- Cobine, J.D.¹

6
- 67349196926
- 10.1002/ppap.200800144 1612-8850
- Deconinck T and Raja L L 2009 Plasma Process. Polym. 6 335
- (2009) Plasma Process. Polym. , vol.6 , pp. 335
- Deconinck, T.¹ Raja, L.L.²

7
- 78649877355
- 10.1140/epjd/e2010-00273-6 1434-6060 D
- Dufour T, Overzet L J, Pitchford L C, Sadeghi N, Lefaucheux P, Kulsreshath M and Ranson P 2010 Eur. Phys. J. D 60 565
- (2010) Eur. Phys. J. , vol.60 , pp. 565
- Dufour, T.¹ Overzet, L.J.² Pitchford, L.C.³ Sadeghi, N.⁴ Lefaucheux, P.⁵ Kulsreshath, M.⁶ Ranson, P.⁷

8
- 84887043812
- Fiala A, Pitchford L C and Boeuf J P 1995 Conf. Phenomena in Ionized Gases (Hoboken, NJ,) p 22
- (1995) Conf. Phenomena in Ionized Gases , pp. 22
- Fiala, A.¹ Pitchford, L.C.² Boeuf, J.P.³

9
- 0346361809
- 10.1088/0022-3727/36/23/006 0022-3727 006
- Hsu D H and Graves D B 2003 J. Phys. D: Appl. Phys. 36 2898-907
- (2003) J. Phys. D: Appl. Phys. , vol.36 , Issue.23 , pp. 2898-2907
- Hsu, D.H.¹ Graves, D.B.²

10
- 80053588781
- 10.1088/0963-0252/20/5/055004 0963-0252 055004
- Lazzaroni C and Chabert P 2011 Plasma Sources Sci. Technol. 20 055004
- (2011) Plasma Sources Sci. Technol. , vol.20 , Issue.5
- Lazzaroni, C.¹ Chabert, P.²

11
- 80055087619
- 10.1088/0022-3727/44/45/455202 0022-3727 455202
- Lazzaroni C and Chabert P 2011 J. Phys. D: Appl. Phys. 44 455202
- (2011) J. Phys. D: Appl. Phys. , vol.44 , Issue.45
- Lazzaroni, C.¹ Chabert, P.²

12
- 84858975732
- 10.1063/1.3690943 053305
- Lazzaroni C and Chabert P 2012 J. Appl. Phys. 111 053305
- (2012) J. Appl. Phys. , vol.111
- Lazzaroni, C.¹ Chabert, P.²

13
- 78649877880
- 10.1140/epjd/e2010-00259-4 1434-6060 D
- Lazzaroni C, Chabert P, Rousseau A and Sadeghi N 2010 Eur. Phys. J. D 60 555
- (2010) Eur. Phys. J. , vol.60 , pp. 555
- Lazzaroni, C.¹ Chabert, P.² Rousseau, A.³ Sadeghi, N.⁴

14
- 77949500743
- 10.1088/0022-3727/43/12/124008 0022-3727 124008
- Lazzaroni C, Chabert P, Rousseau A and Sadeghi N 2010 J. Phys. D: Appl. Phys. 43 124008
- (2010) J. Phys. D: Appl. Phys. , vol.43 , Issue.12
- Lazzaroni, C.¹ Chabert, P.² Rousseau, A.³ Sadeghi, N.⁴

15
- 84889416744
- 10.1002/0471724254
- Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley)
- (2005) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

16
- 0032690466
- 10.1088/0963-0252/8/3/201 0963-0252 201
- Phelps A V and Petrovic Z L 1999 Plasma Sources Sci. Technol. 8 R21
- (1999) Plasma Sources Sci. Technol. , vol.8 , Issue.3 , pp. 21
- Phelps, A.V.¹ Petrovic, Z.L.²

17
- 0003839414
- 10.1007/978-3-642-61247-3
- Raizer Y 1991 Gas Discharge Physics (Berlin: Springer)
- (1991) Gas Discharge Physics
- Raizer, Y.¹

18
- 33645514477
- 10.1088/0022-3727/39/8/021 0022-3727 021
- Rousseau A and Aubert X 2006 J. Phys. D: Appl. Phys. 39 1619
- (2006) J. Phys. D: Appl. Phys. , vol.39 , Issue.8 , pp. 1619
- Rousseau, A.¹ Aubert, X.²

19
- 0031276277
- 10.1088/0963-0252/6/4/003 0963-0252 003
- Schoenbach K H, El-Habachi A, Shi W and Ciocca M 1997 Plasma Sources Sci. Technol. 6 468.
- (1997) Plasma Sources Sci. Technol. , vol.6 , Issue.4 , pp. 468
- Schoenbach, K.H.¹ El-Habachi, A.² Shi, W.³ Ciocca, M.⁴

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