Microstructural and ferromagnetic resonance properties of epitaxial nickel ferrite films grown by chemical vapor deposition

Applied Physics Letters

Volumn 101, Issue 13, 2012, Pages

  Li, N ^a   Schafer S ^a   Datta, R ^b   Mewes, T ^a   Klein, T M ^a   Gupta, A ^a  

^a University of Alabama   (United States)

^b JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIPHASE DOMAINS; DIFFRACTION CONTRAST; FERROMAGNETIC RESONANCE (FMR); FERROMAGNETIC RESONANCE PROPERTIES; FMR LINEWIDTHS; FREQUENCY-DEPENDENT; LIQUID INJECTIONS; MICRO-STRUCTURAL;

CHEMICAL VAPOR DEPOSITION; EPITAXIAL FILMS; FERROMAGNETIC RESONANCE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; VAPORS;

EPITAXIAL GROWTH;

EID: 84886564946     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4754847     Document Type: Article

References (20)

1. C.-W., Nan, M. I., Bichurin, S., Dong, D., Viehland, and G., Srinivasan, J. Appl. Phys., 103, 031101 (2008). 10.1063/1.2836410
2. W., Eerenstein, N. D., Mathur, and J. F., Scott, Nature, 442, 759 (2006). 10.1038/nature05023
3. M., Liu, J., Lou, S. D., Li, and N. X., Sun, Adv. Funct. Mater., 21, 2593 (2011). 10.1002/adfm.201002485
4. N., Li, M., Liu, Z., Zhou, N. X., Sun, D. V. B., Murthy, G., Srinivasan, T. M., Klein, V. M., Petrov, and A., Gupta, Appl. Phys. Lett., 99, 192502 (2011). 10.1063/1.3658900
5. U., Lüders, A., Barthélémy, M., Bibes, K., Bouzehouane, S., Fusil, E., Jacquet, J.-P., Contour, J.-F., Bobo, J., Fontcuberta, and A., Fert, Adv. Mater., 18, 1733 (2006). 10.1002/adma.200500972
6. H., Schröder and E., Glauche, J. Appl. Phys., 39, 1155 (1968). 10.1063/1.1656210
7. V. G., Harris, A., Geiler, Y., Chen, S. D., Yoon, M., Wu, A., Yang, Z., Chen, P., He, P. V., Parimi, X., Zuo, C. E., Patton, M., Abe, O., Acher, and C., Vittoria, J. Magn. Magn. Mater., 321, 2035 (2009). 10.1016/j.jmmm.2009.01.004
8. H., Lee, Y. -H. A., Wang, C. K. A., Mewes, W. H., Butler, T., Mewes, S., Maat, B., York, M. J., Carey, and J. R., Childress, Appl. Phys. Lett., 95, 082502 (2009). 10.1063/1.3207749
9. T., Mewes, R. L., Stamps, H., Lee, E., Edwards, M., Bradford, C. K. A., Mewes, Z., Tadisina, and S., Gupta, IEEE Magn. Lett., 1, 3500204 (2010). 10.1109/LMAG.2010.2055552
10. S., Schäfer, N., Pachauri, C. K. A., Mewes, T., Mewes, C., Kaiser, Q., Leng, and M., Pakala, Appl. Phys. Lett., 100, 032402 (2012). 10.1063/1.3678025
11. W. A., Yager, J. K., Galt, F. R., Merritt, and E. A., Wood, Phys. Rev., 80, 744 (1950). 10.1103/PhysRev.80.744
12. D. W., Healy, Phys. Rev., 86, 1009 (1952). 10.1103/PhysRev.86.1009
13. C. N., Chinnasamy, S. D., Yoon, A., Yang, A., Baraskar, C., Vittoria, and V. G., Harris, J. Appl. Phys., 101, 09M517 (2007). 10.1063/1.2714204
14. L., Torres, M., Zazo, J., Iñiguez, C., de Francisco, and J. M., Muñoz, IEEE Trans. Magn., 29, 3434 (1993). 10.1109/20.281187
15. N., Li, Y. -H. A., Wang, M. N., Iliev, T. M., Klein, and A., Gupta, Chem. Vap. Deposition, 17, 261 (2011). 10.1002/cvde.201106930
16. L. A., Mitlina, A. A., Sidorov, Yu. V., Velikanova, M. R., Vinogradova, and G. S., Badrtdinov, Inorg. Mater., 46, 212 (2010). 10.1134/S0020168510020226
17. R., Datta, S., Kanuri, S. V., Karthik, D., Mazumdar, J. X., Ma, and A., Gupta, Appl. Phys. Lett., 97, 071907 (2010). 10.1063/1.3481365
18. R., Datta, B., Loukya, N., Li, and A., Gupta, J. Cryst. Growth, 345, 44 (2012). 10.1016/j.jcrysgro.2012.02.007
19. D. T., Margulies, F. T., Parker, M. L., Rudee, F. E., Spada, J. N., Chapman, P. R., Aitchison, and A. E., Berkowitz, Phys. Rev. Lett., 79, 5162 (1997). 10.1103/PhysRevLett.79.5162
20. J., Macháčková, Phys. Status Solidi B, 26, 435 (1968). 10.1002/pssb.19680260206