Large magneto-elastic anisotropy enhancement with temperature in composition-graded FeCoTa thin films

Journal of Applied Physics

Volumn 114, Issue 15, 2013, Pages

  Phuoc, Nguyen N ^a   Chapon, Patrick ^b   Acher, Olivier ^b   Ong, C K ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b HORIBA Jobin Yvon Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY ENHANCEMENTS; COMPOSITION-GRADED; DEPOSITION POWER; FERROMAGNETIC RESONANCE FREQUENCY; MAGNETIC ANISOTROPY FIELD; MAGNETO-ELASTIC;

MAGNETIC ANISOTROPY; MAGNETOS; THIN FILMS;

DEPOSITION;

EID: 84886531636     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4825225     Document Type: Article

References (22)

1. M. H. Kryder, E. C. Gage, T. W. McDaniel, W. A. Challener, R. E. Rottmayer, G. Ju, Y.-T. Hsia, and M. F. Erden, Proc. IEEE 96, 1810 (2008). 10.1109/JPROC.2008.2004315
2. A. V. Khvalkovskiy, D. Apalkov, S. Watts, R. Chepulskii, R. S. Beach, A. Ong, X. Tang, A. Driskill-Smith, W. H. Butler, P. B. Visscher, D. Lottis, E. Chen, V. Nikitin, and M. Krounbi, J. Phys. D: Appl. Phys. 46, 074001 (2013). 10.1088/0022-3727/46/7/074001
3. B. Dieny, V. S. Speriosu, S. S. P. Parkin, B. A. Gurney, D. R. Wilhoit, and D. Mauri, Phys. Rev. B 43, 1297 (1991). 10.1103/PhysRevB.43.1297
4. R. L. Stamps, Adv. Funct. Mater. 20, 2380 (2010). 10.1002/adfm.201000310
5. O. Acher, C. Boscher, B. Brule, N. Vukadinovic, G. Suran, and H. Joisten, J. Appl. Phys. 81, 4057 (1997). 10.1063/1.364877
6. X. L. Fan, D. S. Xue, M. Lin, Z. M. Zhang, D. W. Guo, C. J. Jiang, and J. Q. Wei, Appl. Phys. Lett. 92, 222505 (2008). 10.1063/1.2939439
7. J. H. Van Vleck, Phys. Rev. 52, 1178 (1937). 10.1103/PhysRev.52.1178
8. H. B. Callen and E. Callen, J. Phys. Chem. Solids 27, 1271 (1966). 10.1016/0022-3697(66)90012-6
9. J. B. Staunton, S. Ostanin, S. S. A. Razee, B. L. Gyorffy, L. Szunyogh, B. Ginatempo, and E. Bruno, Phys. Rev. Lett. 93, 257204 (2004). 10.1103/PhysRevLett.93.257204
10. B. D. Cullity and C. D. Graham, Introduction to Magnetic Materials, 2nd ed. (John Wiley Sons, Inc., Hoboken, New Jersey, USA, 2009).
11. N. N. Phuoc and C. K. Ong, Adv. Mater. 25, 980 (2013). 10.1002/adma.201203995
12. N. N. Phuoc and C. K. Ong, Appl. Phys. Lett. 102, 212406 (2013). 10.1063/1.4808165
13. N. N. Phuoc and C. K. Ong, J. Appl. Phys. 113, 203916 (2013). 10.1063/1.4807927
14. S. Li, Z. Huang, J. -G. Duh, and M. Yamaguchi, Appl. Phys. Lett. 92, 092501 (2008). 10.1063/1.2889447
15. F. Zheng, X. Wang, X. Li, J. Bai, D. Wei, X. Liu, W. Xie, and F. Wei, J. Appl. Phys. 109, 07B509 (2011). 10.1063/1.3551593
16. N. N. Phuoc, L. T. Hung, and C. K. Ong, J. Alloys Compd. 509, 4010 (2011). 10.1016/j.jallcom.2010.12.208
17. S. Li, H. Du, Q. Xue, S. Xie, M. Liu, W. Shao, J. Xu, T. Nan, N. X. Sun, and J.-G. Duh, J. Appl. Phys. 113, 17A332 (2013). 10.1063/1.4799480
18. R. D. Galindo, R. Gago, D. Duday, and C. Palacio, Anal. Bioanal. Chem. 396, 2725 (2010). 10.1007/s00216-009-3339-y
19. Y. Liu, L. F. Chen, C. Y. Tan, H. J. Liu, and C. K. Ong, Rev. Sci. Instrum. 76, 063911 (2005). 10.1063/1.1935429
20. C. Kittel, Phys. Rev. 71, 270 (1947). 10.1103/PhysRev.71.270.2
21. N. D. Rizzo, B. N. Engel, J. A. Janesky, J. M. Slaughter, and J. Sun, U.S. patent 6,818,961 B1 (2004).
22. S. J. Kernion, P. R. Ohodnicki, Jr., J. Grossmann, A. Leary, S. Shen, V. Keylin, J. F. Huth, J. Horwath, M. S. Lucas, and M. E. McHenry, Appl. Phys. Lett. 101, 102408 (2012). 10.1063/1.4751253