Role of deposition magnetic field on magnetic properties and their unusual thermal behaviors of FeCoZr films prepared by gradient composition sputtering

Journal of Applied Physics

Volumn 113, Issue 20, 2013, Pages

  Phuoc, Nguyen N ^a   Ong, C K ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT ALLOYS; DEPOSITION; IRON ALLOYS; MAGNETIC FIELDS; TERNARY ALLOYS; ZIRCALOY;

DEPOSITION POWER; DEPOSITION PROCESS; INDUCED MAGNETIC ANISOTROPY; MICROWAVE PROPERTY; RESONANCE FREQUENCIES; SPUTTERING TECHNIQUES; TEMPERATURE DEPENDENT; THERMAL BEHAVIORS;

MAGNETIC ANISOTROPY;

EID: 84879124676     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4807927     Document Type: Article

References (22)

1. B. D. Cullity and C. D. Graham, Introduction to Magnetic Materials, 2nd ed. (John Wiley Sons, Inc., Hoboken, New Jersey, 2009).
2. J. H. van Vleck, Phys. Rev. 52, 1178 (1937). 10.1103/PhysRev.52.1178
3. C. Zener, Phys. Rev. 96, 1335 (1954). 10.1103/PhysRev.96.1335
4. J. B. Staunton, L. Szunyogh, A. Buruzs, B. L. Gyorffy, S. Ostanin, and L. Udvardi, Phys. Rev. B 74, 144411 (2006). 10.1103/PhysRevB.74.144411
5. K. O'Grady, L. E. Fernandez-Outon, and G. Vallejo-Fernandez, J. Magn. Magn. Mater. 322, 883 (2010). 10.1016/j.jmmm.2009.12.011
6. J.-U. Thiele, S. Maat, and E. E. Fullerton, Appl. Phys. Lett. 82, 2859 (2003). 10.1063/1.1571232
7. W. A. Challener, C. Peng, A. V. Itagi, D. Karns, W. Peng, Y. Peng, X. M. Yang, X. Zhu, N. J. Gokemeijer, Y.-T. Hsia, G. Ju, R. E. Rottmayer, M. A. Seigler, and E. C. Gage, Nature Photon. 3, 220-224 (2009). 10.1038/nphoton.2009. 26
8. N. D. Rizzo, B. N. Engel, J. A. Janesky, J. M. Slaughter, and J. Sun, U.S. patent 6,818,961 B1 (2004).
9. I. L. Prejbeanu, S. Bandiera, J. Alvarez-Hérault, R. C. Sousa, B. Dieny, and J.-P. Nozières, J. Phys. D: Appl. Phys. 46, 074002 (2013). 10.1088/0022-3727/46/7/074002
10. M. Ledieu, F. Schoenstein, J.-H. Le Gallou, O. Valls, S. Queste, F. Duverger, and O. Acher, J. Appl. Phys. 93, 7202-7204 (2003). 10.1063/1.1555902
11. Y. Lamy and B. Viala, IEEE Trans. Magn. 42, 3332-3334 (2006). 10.1109/TMAG.2006.878871
12. N. N. Phuoc, G. Chai, and C. K. Ong, J. Appl. Phys. 112, 083925 (2012). 10.1063/1.4763361
13. N. N. Phuoc and C. K. Ong, Adv. Mater. 25, 980 (2013). 10.1002/adma.201203995
14. S. Li, Z. Huang, J.-G. Duh, and M. Yamaguchi, Appl. Phys. Lett. 92, 092501 (2008). 10.1063/1.2889447
15. F. Zheng, X. Wang, X. Li, J. Bai, D. Wei, X. Liu, W. Xie, and F. Wei, J. Appl. Phys. 109, 07B509 (2011). 10.1063/1.3551593
16. N. N. Phuoc, L. T. Hung, and C. K. Ong, J. Alloys Compd. 509, 4010 (2011). 10.1016/j.jallcom.2010.12.208
17. S. Li, M. Liu, J. Lou, X. Xing, Z. Su, Z. Zhou, F. Xu, J.-G. Duh, and N. X. Sun, IEEE Trans. Magn. 47, 3935 (2011). 10.1109/TMAG.2011.2157312
18. Y. Liu, L. F. Chen, C. Y. Tan, H. J. Liu, and C. K. Ong, Rev. Sci. Instrum. 76, 063911 (2005). 10.1063/1.1935429
19. C. Kittel, Phys. Rev. 71, 270 (1947). 10.1103/PhysRev.71.270.2
20. S. J. Kernion, P. R. Ohodnicki, Jr., J. Grossmann, A. Leary, S. Shen, V. Keylin, J. F. Huth, J. Horwath, M. S. Lucas, and M. E. McHenry, Appl. Phys. Lett. 101, 102408 (2012). 10.1063/1.4751253
21. N. N. Phuoc and C. K. Ong, " Observation of magnetic anisotropy increment with temperature in composition-graded FeCoZr thin films.," Appl. Phys. Lett. (in press). 10.1063/1.4808165
22. S. A. Campbell, The Science and Engineering of Microelectronic Fabrication, 2nd ed. (Oxford University Press, USA, 2001).