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Journal of Applied Physics

Volumn 114, Issue 14, 2013, Pages

In-situ energy dispersive x-ray diffraction study of the growth of CuO nanowires by annealing method

(6) Srivastava, Himanshu a Ganguli, Tapas a Deb, S K a Sant, Tushar b Poswal, H K b Sharma, Surinder M b

a RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY (India)

b BHABHA ATOMIC RESEARCH CENTRE (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING METHODS; CUO NANOWIRES; ENERGY DISPERSIVE X-RAY DIFFRACTIONS; GROWTH MODELING; IN-SITU GROWTH; IN-SITU OBSERVATIONS; OPTIMUM TEMPERATURE; TEMPERATURE RANGE;

COMPRESSIVE STRESS; METAL CLADDING; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

NANOWIRES;

EID: 84886016285 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.4824177 Document Type: Article

Times cited : (9)

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