Wet and dry adhesion properties of self-selective nanowire connectors

Advanced Functional Materials

Volumn 19, Issue 19, 2009, Pages 3098-3102

  Ko, Hyunhyub ^a,b   Zhang, Zhenxing ^a,b,c   Chueh, Yu Lun ^a,b   Ho, Johnny C ^a,b   Lee, Jongho ^a   Fearing, Ronald S ^a   Javey, Ali ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c LANZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION STRENGTHS; CRITICAL PROPERTIES; LOTUS EFFECT; LUBRICATING CONDITION; REVERSIBLE BINDING; SELF CLEANING; SUPER-HYDROPHOBIC SURFACES; VAN DER WAALS INTERACTIONS; WET AND DRY;

HYDROCARBONS; HYDROPHOBICITY; MINERAL OILS; NANOWIRES; SHEAR STRENGTH; SURFACE CLEANING; VAN DER WAALS FORCES;

ADHESION;

EID: 70349659790     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.200901178     Document Type: Article

References (26)

1. C. Sanchez, H. Arribart, M. M. G. Guille, Nat. Mater. 2005, 4, 227.
2. M. A. Meyers, P.-Y. Chen, A. Y. Lin, Y. Seki, Prag. Mater. Sci. 2008, 53, 1.
3. K. Autumn, Y. A. Liang, S. T. Hsieh, W. Zesch, W.-P. Chan, W. T. Kenny, R. Fearing, R. J. Full, Nature 2000, 405, 681.
4. L. Qu, L. Dai, M. Stone, Z. Xia, Z. L. Wang, Science 2008, 322, 238.
5. L. Ge, S. Sethi, L. Ci, P. M. Ajayan, A. Dhinojwala, Proc. Natl. Acad. Sci. USA 2007, 104, 10792.
6. M. Murphy, B. Aksak, M. Sitti, J. Adhes. Sci. Technol. 2007, 21, 1281.
7. L. Qu, L. Dai, Adv. Mater. 2007, 19, 3844.
8. G. Huber, H. Mantz, R. Spolenak, K. Mecke, K. Jacobs, S. N. Gorb, E. Arzt, Proc. Natl. Acad. Sci. USA 2005, 102, 16293.
9. W. Barthlott, C. Neinhuis, Planta 1997, 202, 1.
10. R. Blossey, Nat. Mater. 2003, 2, 301.
11. J. Chen, Z. Fan, J. Zou, J. Engel, C. Liu, J. Aerospace Eng. 2003, 16, 85.
12. G. J. M. Krijnen, M. Dijkstra, J. J. van Baar, S. S. Shankar, W. J. Kuípers, R. J. H. de Boer, D. Altpeter, T. S. J. Lammerink, R. Wiegerink, Nanotechnology 2006. 17, S84.
13. K. Autumn, M. Sitti, A. Peattie, W. Hansen, S. Sponberg, Y. A. Liang, T. Kenny, R. Fearing, J. Israelachvili, R. J. Full, Proc. Natl. Acad. Sci. USA 2002, 99, 12252.
14. H. Ko, J. Lee, B. E. Schubert, Y.-L. Chueh, P. W. Leu, R. S. Fearing, A. Javey, Nano Lett. 2009, 9, 2054.
15. A. K. Geim, S. V. Dubonos, I. V. Grigorieva, K. S. Novoselov, A. A. Zhukov, S. Yu. Shapoval, Nat. Mater 2003, 2, 461.
16. Y. Zhao, T. Tong, L. Delzeit, A. Kashani, M. Meyyappan, A. Majumdar, J. Vac. Sci. Technol. B 2006, 24, 331.
17. A. Lafuma, D. Quéré, Nat. Mater 2003, 2, 457.
18. J. Yuan, X. Liu, O. Akbulut, J. Hu, S. L Suib, J. Kong, F. Stellacci, Nat. Nanotechnol. 2008, 3, 332.
19. H. Lee, B. P. Lee, P. B. Messersmith, Nature 2007, 448, 338.
20. A. Mahdavi, L. Ferreira, C. Sundback, J. W. Níchol, E. P. Chan, D. J. D. Carter, C. J. Bettinger, S. Patanavanich, L. Chignozha, E. Ben-Joseph, A. Galakatos, H. Pryor, I. Pomerantseva, P. T. Masiakos, W. Faquin, A. Zumbuehl, S. Hong, J. Borenstein, J. Vacanti, R. Langer, J. M. Karp, Proc. Natl. Acad. Sci. USA 2008, 105, 2307.
21. A. Lafuma, D. Quéré, Nat. Mater 2003, 2, 457.
22. E. Bormashenko, R. Pogreb, G. Whyman, M. Erlich, Langmuir 2007, 23, 6501.
23. J. Israelachvili, Intermolecular and Surface Forces, Academic, New York 1992.
24. H.-J. Butt, B. Cappella, M. Kappl, Surf. Sci. Rep. 2005, 59, 1.
25. J. B. Fortin, T.-M. Lu, Chemical Vapor Deposition Polymerization: The Growth and Properties of Parylene Thin Films, Kluwer Academic, Norwell, MA 2004.
26. Z. Fan, J. C. Ho, Z. A. Jacobson, R. Yerushalmi, R. L. Alley, H. Razavi, A. Javey, Nano Lett. 2008, 8, 20.