Effect of annealing temperature on nanocrystalline TiO2thin filmsprepared by sol-gel dip coating method

Optik

Volumn 124, Issue 23, 2013, Pages 6201-6204

  Ranjitha, A ^a   Muthukumarasamy, N ^a   Thambidurai, M ^b   Balasundaraprabhu, R ^c   Agilan, S ^a  

^a Department of Artificial Intelligence and Machine Learning   (India)

^b Seoul National University   (South Korea)

^c PSG COLLEGE OF TECHNOLOGY   (India)

Author keywords

E; H; M; Nanocrystalline materials; R; Semiconductors; Sol gel method; Solar energy materials; T

Indexed keywords

COATINGS; EINSTEINIUM; ELECTROMAGNETIC WAVE ABSORPTION; LIGHT ABSORPTION; NANOCRYSTALLINE MATERIALS; PARTICLE SIZE; SEMICONDUCTOR MATERIALS; SOL-GEL PROCESS; SOL-GELS; SOLAR ENERGY; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ABSORPTION EDGES; ANATASE PHASE; ANNEALING TEMPERATURES; AVERAGE PARTICLE SIZE; EFFECT OF ANNEALING; NANO-CRYSTALLINE TIO; SOL-GEL DIP-COATING METHOD; SOLAR ENERGY MATERIALS;

NANOCRYSTALS;

EID: 84885179207     PISSN: 00304026     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijleo.2013.04.085     Document Type: Article

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