Synthesis of photosensitive nanograined TiO2 thin films by SILAR method

Journal of Alloys and Compounds

Volumn 478, Issue 1-2, 2009, Pages 711-715

  Patil, U M ^a   Gurav, K V ^a   Joo, Oh Shim ^b   Lokhande, C D ^b  

^a SHIVAJI UNIVERSITY   (India)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

Chemical synthesis; Optical properties; Photoelectrochemical properties; Thin film; Titanium dioxide (TiO2)

Indexed keywords

AQUEOUS SOLUTIONS; AS-DEPOSITED FILMS; CHEMICAL SYNTHESIS; COATED GLASS SUBSTRATES; FLUORINE-DOPED TIN OXIDES; FOURIER TRANSFORM INFRARED; NANO-CRYSTALLINE; NANOCRYSTALLINE TIO; PHOTOELECTROCHEMICAL PROPERTIES; POROUS TIO; SELECTED-AREA ELECTRON DIFFRACTIONS; SEM; SILAR METHODS; SUCCESSIVE IONIC LAYER ADSORPTION AND REACTIONS; TEM; UV-VIS-NIR SPECTROPHOTOMETERS; X-RAY DIFFRACTIONS;

ADSORPTION; CONVERSION EFFICIENCY; DIFFRACTION; DOPING (ADDITIVES); FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; NANOCRYSTALLINE MATERIALS; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THIN FILM DEVICES; THIN FILMS; TIN; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

INTEGRATED OPTOELECTRONICS;

EID: 67349233671     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.11.160     Document Type: Article

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