Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications

Photonics Letters of Poland

Volumn 3, Issue 3, 2011, Pages 98-100

  Iwulska, A ^a   Sliwinski G ^a  

^a POLISH ACADEMY OF SCIENCES   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

BUFFER GAS; CHEMICAL COMPOSITIONS; IN-VACUUM; PHOTOCATALYTIC APPLICATION; POROUS THIN FILMS; POROUS TIO; PULSED-LASER DEPOSITION TECHNIQUE; RAMAN ANALYSIS; RUTILE PHASE; SI SUBSTRATES; STRUCTURE PROPERTY; TIO; XRD;

CHEMICAL ANALYSIS; FILM PREPARATION; OXIDE MINERALS; PULSED LASER DEPOSITION; SILICON COMPOUNDS; TITANIUM DIOXIDE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

PULSED LASERS;

EID: 80053588886     PISSN: None     EISSN: 20802242     Source Type: Journal    
DOI: 10.4302/plp.2011.3.03     Document Type: Article

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