Interface energetics at WOX/organic interfaces: The role of oxygen vacancies

Applied Physics Letters

Volumn 103, Issue 13, 2013, Pages

  Zhang, Zheng ^a   Wei, Huai Xin ^a   Ma, Guo Fu ^a   Li, Yan Qing ^a   Lee, Shuit Tong ^a   Tang, Jian Xin ^a  

^a SOOCHOW UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

HOLE INJECTION BARRIERS; HOLE TRANSPORT LAYERS; INTERFACE ENERGETICS; ORGANIC ELECTRONIC DEVICES; OXYGEN DEFICIENCY; PARTIAL FILLING; PARTIAL REDUCTION; THERMAL-ANNEALING;

CHARGE INJECTION; ELECTRONIC STRUCTURE; PHOTOELECTRON SPECTROSCOPY;

OXYGEN VACANCIES;

EID: 84885002963     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4822173     Document Type: Article

References (25)

1. T. Matsumoto, T. Nakada, J. Endo, K. Mori, N. Kavamura, A. Yokoi, and J. Kido, SID Int. Symp. Digest Tech. Papers 34, 979 (2003). 10.1889/1.1832449
2. Y. Xiao, J. P. Yang, P. P. Cheng, J. J. Zhu, Z. Q. Xu, Y. H. Deng, S. T. Lee, Y. Q. Li, and J. X. Tang, Appl. Phys. Lett. 100, 013308 (2012). 10.1063/1.3675970
3. H. M. Zhang, Y. F. Dai, D. G. Ma, and H. M. Zhang, Appl. Phys. Lett. 91, 123504 (2007). 10.1063/1.2787877
4. S. Hamwi, J. Meyer, M. Kröger, T. Winkler, M. Witte, T. Riedl, A. Kahn, and W. Kowalsky, Adv. Funct. Mater. 20, 1762 (2010). 10.1002/adfm. 201000301
5. H. Kanno, R. J. Holmes, Y. Sun, S. K. Cohen, and S. R. Forrest, Adv. Mater. 18, 339 (2006). 10.1002/adma.200501915
6. P. Chen, Q. Xue, W. F. Xie, G. H. Xie, Y. Duan, Y. Zhao, S. Y. Liu, L. Y. Zhang, and B. Li, Appl. Phys. Lett. 95, 123307 (2009). 10.1063/1.3234379
7. J. X. Tang, M. K. Fung, C. S. Lee, and S. T. Lee, J. Mater. Chem. 20, 2539 (2010). 10.1039/b921699e
8. C. C. Chang, S. W. Hwang, C. H. Chen, and J. F. Chen, Jpn. J. Appl. Phys. Part 1 43, 6418 (2004). 10.1143/JJAP.43.6418
9. J. Meyer, S. Hamwi, S. Schmale, T. Winkler, H. H. Johannes, T. Riedl, and W. Kowalsky, J. Mater. Chem. 19, 702 (2009). 10.1039/b819485h
10. M. J. Son, S. Kim, S. Kwon, and J. W. Kim, Org. Electron. 10, 637 (2009). 10.1016/j.orgel.2009.02.017
11. J. Meyer, S. Hamwi, M. Kröger, W. Kowalsky, T. Riedl, and A. Kahn, Adv. Mater. 24, 5408 (2012). 10.1002/adma.201201630
12. H. M. Zhang, W. C. H. Choy, and Y. F. Dai, J. Phys. D: Appl. Phys. 41, 105108 (2008). 10.1088/0022-3727/41/10/105108
13. T. Y. Chu, J. F. Chen, S. Y. Chen, C. J. Chen, and C. H. Chen, Appl. Phys. Lett. 89, 053503 (2006). 10.1063/1.2268923
14. Q. Y. Bao, J. P. Yang, J. X. Tang, Y. Q. Li, C. S. Lee, and S. T. Lee, Org. Electron. 11, 1578 (2010). 10.1016/j.orgel.2010.07.009
15. M. T. Greiner, M. G. Helander, W. M. Tang, Z. B. Wang, J. Qiu, and Z. H. Lu, Nature Mater. 11, 76 (2012). 10.1038/nmat3159
16. M. Vasilopoulou, G. Papadimitropoulos, L. C. Palilis, D. G. Georgiadou, P. Argitis, S. Kennou, I. Kostis, N. Vourdas, N. A. Stathopoulos, and D. Davazoglou, Org. Electron. 13, 796 (2012). 10.1016/j.orgel.2012.01.008
17. I. Irfan, A. J. Turinske, Z. Bao, and Y. Gao, Appl. Phys. Lett. 101, 093305 (2012). 10.1063/1.4748978
18. J. Meyer, T. Winkler, S. Hamwi, S. Schmale, H. H. Johannes, T. Weimann, P. Hinze, W. Kowalsky, and T. Riedl, Adv. Mater. 20, 3839 (2008). 10.1002/adma.200800949
19. K. Hong, K. Kim, S. Kim, I. Lee, H. Cho, S. Yoo, H. W. Choi, N. Y. Lee, Y. H. Tak, and J. L. Lee, J. Phys. Chem. C 115, 3453 (2011). 10.1021/jp109943b
20. M. T. Greiner, L. Chai, M. G. Helander, W. M. Tang, and Z. H. Lu, Adv. Funct. Mater. 22, 4557 (2012). 10.1002/adfm.201200615
21. L. Lozzi, L. Ottaviano, M. Passacantando, S. Santucci, and C. Cantalini, Thin Solid Films 391, 224 (2001). 10.1016/S0040-6090(01)00986-5
22. F. Bussolotti, L. Lozzi, M. Passacantando, S. La Rosa, S. Santucci, and L. Ottaviano, Surf. Sci. 538, 113 (2003). 10.1016/S0039-6028(03)00696-4
23. J. S. Lee, I. H. Jang, and N. G. Park, J. Phys. Chem. C 116, 13480 (2012). 10.1021/jp2122505
24. L. Weinhardt, M. Blum, M. Bär, C. Heske, B. Cole, B. Marsen, and E. L. Miller, J. Phys. Chem. C 112, 3078 (2008). 10.1021/jp7100286
25. Y. H. Kim, S. Kwon, J. H. Lee, S. M. Park, Y. M. Lee, and J. W. Kim, J. Phys. Chem. C 115, 6599 (2011). 10.1021/jp111128k