Development of a nano-stereolithography system using evanescent light for submicron fabrication

Proceedings of the 21st Annual ASPE Meeting, ASPE 2006

Volumn , Issue , 2006, Pages

  Kajihara, Yusuke ^a   Takeuchi, Toru ^a   Takahashi, Satoru ^a   Takamasu, Kiyoshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84884792242     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. Paul F. Jacobs, 1992, Rapid Prototyping & Manufacturing, SME.
2. T. Hayashi, T. Miyoshi, Y. Takaya and S. Takahashi, 2000, Nonlaminate Micro Stereolithography Using TFT LCD, Proceedings of the 2nd euspen, 1: 98-106.
3. S. Kawata, H B. Sun, T. Tanaka, and K. Takada, 2001, Finer features for functional microdevices, Nature, 412: 697-698.
4. S. Maruo and K. Ikuta, 2002, Submicron stereolithography for the production of freely movable mechanisms by using single-photon polymerization, Sensors and Actuators A, 100: 70-76.
5. Kock K. Seet, V. Mizeikis, S. Juodkazis, and H. Misawa, 2006, Three-dimensional circular spiral photonic crystal structures recorded by femtosecond pulse, Journal of Non-Crystalline Solids, 352: 2390-2394.
6. Y. Kajihara, Y. Inazuki, S. Takahashi, and K. Takamasu, 2004, Study of Nano- Stereolithography Using Evanescent Light, Proceedings of ASPE annual meeting: 149-152.
7. S. Takahashi, Y. Inazuki, Y. Kajihara, and K. Takamasu, 2005, Photofabrication of periodic submicron structures using standing evanescent light for nano-stereolithography, Proceedings of ASPE annual meeting: 1729-1732.