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Contributions to Plasma Physics

Volumn 53, Issue 8, 2013, Pages 588-591

Measurements of SiH4/H2 VHF plasma parameters with heated langmuir probe

(7) Yamane, T a Nakao, S a Takeuchi, Y a Muta, H b Ichiki, R c Uchino, K b Kawai, Y b

a MITSUBISHI HEAVY INDUSTRIES LTD (Japan)

b KYUSHU UNIVERSITY (Japan)

c OITA UNIVERSITY (Japan)

Author keywords

Multi rod electrode; Negative ions; Silicon thin film; VHF plasma; Wall potential

Indexed keywords

LANGMUIR PROBES; SILICON; SILICON COMPOUNDS;

% REDUCTIONS; GAS CONCENTRATION; ION DENSITY; MEASUREMENTS OF; MULTI-ROD ELECTRODES; PLASMA PARAMETER; SILANE GAS; SILICON THIN FILM; VHF PLASMA; WALL POTENTIAL;

NEGATIVE IONS;

EID: 84884713140 PISSN: 08631042 EISSN: 15213986 Source Type: Journal
DOI: 10.1002/ctpp.201200125 Document Type: Article

Times cited : (2)

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