Node connection/quantum phase-shifting mask - path to below 0.3-μm pitch, proximity effect free random interconnect and memory patterning

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1999, Pages 123-124

  Fukuda, Hiroshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DATA STORAGE EQUIPMENT; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT MANUFACTURE; LOGIC GATES; PHASE SHIFT; VLSI CIRCUITS;

INTERCONNECT PITCH; MEMORY PATTERNING; NODE CONNECTING PHASE SHIFTING MASKS; OPTICAL PROXIMITY EFFECT CORRECTIONS; QUANTUM PHASE SHIFTING MASKS;

MASKS;

EID: 0033280392     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)