Low temperature growth of complete monolayer graphene films on Ni-doped copper and gold catalysts by a self-limiting surface reaction

Carbon

Volumn 64, Issue , 2013, Pages 315-323

  Woo, Yun Sung ^a   Seo, David H ^a   Yeon, Dong Hee ^b   Heo, Jinseong ^a   Chung, Hyun Jong ^a   Benayad, Anass ^c   Chung, Jae Gwan ^c   Han, Hyouksoo ^c   Lee, Hyo Sug ^b   Seo, Sunae ^d   Choi, Jae Young ^a  

^a Graphene Research Center   (South Korea)

^b Material Application Group   (South Korea)

^c Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^d Sejong University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BIMETALLIC CATALYSTS; CATALYTIC REACTIONS; GRAPHENE DEVICES; INDUCTIVELY-COUPLED; LOW TEMPERATURE GROWTH; LOW TEMPERATURES; LOWER TEMPERATURES; ROOM TEMPERATURE;

CATALYSIS; CATALYST ACTIVITY; GOLD; GRAPHENE; INDUCTIVELY COUPLED PLASMA; METAL CLADDING; MONOLAYERS; NICKEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE REACTIONS; TEMPERATURE;

COPPER;

EID: 84883598771     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2013.07.081     Document Type: Article

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