Electrical and optical properties of N-doped SnO2 thin films prepared by magnetron sputtering

Surface and Coatings Technology

Volumn 231, Issue , 2013, Pages 67-70

  Ding, Xiaoxiong ^a   Fang, Feng ^a   Jiang, Jianqing ^a  

^a SOUTHEAST UNIVERSITY   (China)

Author keywords

Electrical and optical properties; Magnetron sputtering; Nitrogen doping; Tin oxide films

Indexed keywords

ELECTRICAL AND OPTICAL PROPERTIES; FOUR-POINT PROBE; LOW OXYGEN PRESSURE; NITROGEN-DOPING; OXYGEN PARTIAL PRESSURE; RF-MAGNETRON SPUTTERING; RUTILE STRUCTURE; VISIBLE REGION;

ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; OPTICAL BAND GAPS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDE MINERALS; PARTIAL PRESSURE; POSITIVE IONS; SEMICONDUCTOR DOPING; TIN; TIN OXIDES;

FILM PREPARATION;

EID: 84882910475     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.03.060     Document Type: Article

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