Effects of deposition temperature and hydrogen flow rate on the properties of the Al-doped ZnO thin films and amorphous silicon thin-film solar cells

Applied Physics A: Materials Science and Processing

Volumn 112, Issue 4, 2013, Pages 877-883

  Huang, Chia Cheng ^a   Wang, Fang Hsing ^a   Yang, Chen Fu ^b  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b NATIONAL UNIVERSITY OF KAOHSIUNG   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO THIN FILMS; BURSTEIN-MOSS SHIFT; DEPOSITION TEMPERATURES; HYDROGEN FLOW RATE; OPTICAL TRANSMISSION SPECTRUM; RADIO-FREQUENCY MAGNETRON SPUTTERING SYSTEM; SILICON THIN-FILM SOLAR CELLS; TRANSPARENT ELECTRODE;

ALUMINUM; AMORPHOUS SILICON; FLOW RATE; LIGHT TRANSMISSION; SINTERING; SOLAR CELLS; THIN FILMS;

DEPOSITION;

EID: 84881552929     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-012-7270-2     Document Type: Article

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